Magnetron deposition of copper oxide coatings in a metallic mode enhanced by RF-ICP source: A role of substrate biasing; Vacuum; Vol. 211

Magnetron deposition of copper oxide coatings in a metallic mode enhanced by RF-ICP source: A role of substrate biasing; Vacuum; Vol. 211

Detalles Bibliográficos
Parent link:Vacuum
Vol. 211.— 2023.— [111956, 4 p.]
Autor Principal: Sidelev D. V. Dmitry Vladimirovich
Autor Corporativo: Национальный исследовательский Томский политехнический университет Инженерная школа ядерных технологий Научно-образовательный центр Б. П. Вейнберга
Outros autores: Voronina E. D. Ekaterina Dmitrievna, Bleykher (Bleicher) G. A. Galina Alekseevna
Summary:Title screen
The article describes deposition of copper oxide coatings using magnetron sputtering in a metallic mode enhanced by a radio-frequency inductively coupled plasma (RF-ICP) source. The role of substrate biasing (floating potential, -70 and -140 V) on structural properties and elemental composition of copper oxide coatings is determined using SEM with EDS, XRD and TEM. This study shows the change of coating microstructure from columnar to dense/compact and the increase in crystallinity degree of coatings, when the substrate is biased. EDS analysis reveals the presence of Ar and the increase in O content in the coating due to intensive ion bombardment. Deposition conditions are changed using substrate biasing, which suggests the contribution of ion bombardment to the coating deposition in the case of magnetron sputtering of copper oxide in the metallic mode.
Режим доступа: по договору с организацией-держателем ресурса
Idioma:inglés
Publicado: 2023
Subjects:
электронный ресурс
труды учёных ТПУ
magnetron sputtering
metallic mode
copper oxide
coating
substrate bias
RF-ICP source
Acceso en liña:https://doi.org/10.1016/j.vacuum.2023.111956
Formato: Electrónico Capítulo de libro
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=669230

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