Magnetron deposition of copper oxide coatings in a metallic mode enhanced by RF-ICP source: A role of substrate biasing
| Parent link: | Vacuum Vol. 211.— 2023.— [111956, 4 p.] |
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| その他の著者: | , |
| 要約: | Title screen The article describes deposition of copper oxide coatings using magnetron sputtering in a metallic mode enhanced by a radio-frequency inductively coupled plasma (RF-ICP) source. The role of substrate biasing (floating potential, -70 and -140 V) on structural properties and elemental composition of copper oxide coatings is determined using SEM with EDS, XRD and TEM. This study shows the change of coating microstructure from columnar to dense/compact and the increase in crystallinity degree of coatings, when the substrate is biased. EDS analysis reveals the presence of Ar and the increase in O content in the coating due to intensive ion bombardment. Deposition conditions are changed using substrate biasing, which suggests the contribution of ion bombardment to the coating deposition in the case of magnetron sputtering of copper oxide in the metallic mode. Режим доступа: по договору с организацией-держателем ресурса |
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2023
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| オンライン･アクセス: | https://doi.org/10.1016/j.vacuum.2023.111956 |
| フォーマット: | 電子媒体 図書の章 |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=669230 |
| 要約: | Title screen The article describes deposition of copper oxide coatings using magnetron sputtering in a metallic mode enhanced by a radio-frequency inductively coupled plasma (RF-ICP) source. The role of substrate biasing (floating potential, -70 and -140 V) on structural properties and elemental composition of copper oxide coatings is determined using SEM with EDS, XRD and TEM. This study shows the change of coating microstructure from columnar to dense/compact and the increase in crystallinity degree of coatings, when the substrate is biased. EDS analysis reveals the presence of Ar and the increase in O content in the coating due to intensive ion bombardment. Deposition conditions are changed using substrate biasing, which suggests the contribution of ion bombardment to the coating deposition in the case of magnetron sputtering of copper oxide in the metallic mode. Режим доступа: по договору с организацией-держателем ресурса |
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| DOI: | 10.1016/j.vacuum.2023.111956 |