Repetitively-pulsed nitrogen implantation in titanium by a high-power density ion beam

Bibliographic Details
Parent link:Energy Fluxes and Radiation Effects (EFRE): proceedings of 8th International Congress, October 2-8, 2022, Tomsk, Russia.— , 2022
International Conference on Modification of Materials with Particle Beams and Plasma Flows (16th CMM).— 2022.— [P. 948-954]
Corporate Author: Национальный исследовательский Томский политехнический университет Инженерная школа ядерных технологий Научная лаборатория высокоинтенсивной имплантации ионов
Other Authors: Ryabchikov A. I. Aleksandr Ilyich, Korneva O. S. Olga Sergeevna, Sivin D. O. Denis Olegovich, Chernyshev A. A.
Summary:Title screen
The article presents the results of studies of the features and regularities of high-intensity nitrogen ion implantation into titanium using repetitively-pulsed beams with high average and pulsed power densities. It is shown that the method of low-energy high-intensity nitrogen ion implantation at current densities of 180, 140, 60, and 10 mA/cm2 makes it possible to obtain wide ion-doped layers in titanium. The regularities of changes in both thickness and elemental composition of ion-doped layers depending on the ion current density have been established. It has been established that a wide diffusion layer is observed at ion current densities from 60 to 180 mA/cm2 . Nitrogen concentration in the diffusion layer increases with an increase in the ion current density. As a result of a long highintensity implantation process at temperatures of 700 and 850 °C, the titanium microstructure deteriorates in the entire volume of the sample material. The article presents the transmission electron microscopy data showing that the modified layers at a depth of 10 μm consist of α-Ti, in the volume of which nanosized particles of δ-TiN with average size of 15.4 nm crystallize. Numerical simulation is used to study the change in temperature fields in titanium under the action of a pulsed and repetitively-pulsed ion beam with submillisecond duration on the surface with a power density from 20 to 30 kW/cm2 . The results of experimental studies of the pulsed impact of high-pulse ion beams on the titanium microstructure are discussed.
Language:English
Published: 2022
Subjects:
Online Access:https://doi.org/10.56761/EFRE2022.C3-P-020705
Format: Electronic Book Chapter
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=669186

MARC

LEADER 00000naa0a2200000 4500
001 669186
005 20250704110217.0
035 |a (RuTPU)RU\TPU\network\40426 
035 |a RU\TPU\network\40197 
090 |a 669186 
100 |a 20230222d2022 k||y0rusy50 ba 
101 0 |a eng 
135 |a drcn ---uucaa 
181 0 |a i  
182 0 |a b 
200 1 |a Repetitively-pulsed nitrogen implantation in titanium by a high-power density ion beam  |f A. I. Ryabchikov, O. S. Korneva, D. O. Sivin, A. A. Chernyshev 
203 |a Текст  |c электронный 
300 |a Title screen 
320 |a [References: 15 tit.] 
330 |a The article presents the results of studies of the features and regularities of high-intensity nitrogen ion implantation into titanium using repetitively-pulsed beams with high average and pulsed power densities. It is shown that the method of low-energy high-intensity nitrogen ion implantation at current densities of 180, 140, 60, and 10 mA/cm2 makes it possible to obtain wide ion-doped layers in titanium. The regularities of changes in both thickness and elemental composition of ion-doped layers depending on the ion current density have been established. It has been established that a wide diffusion layer is observed at ion current densities from 60 to 180 mA/cm2 . Nitrogen concentration in the diffusion layer increases with an increase in the ion current density. As a result of a long highintensity implantation process at temperatures of 700 and 850 °C, the titanium microstructure deteriorates in the entire volume of the sample material. The article presents the transmission electron microscopy data showing that the modified layers at a depth of 10 μm consist of α-Ti, in the volume of which nanosized particles of δ-TiN with average size of 15.4 nm crystallize. Numerical simulation is used to study the change in temperature fields in titanium under the action of a pulsed and repetitively-pulsed ion beam with submillisecond duration on the surface with a power density from 20 to 30 kW/cm2 . The results of experimental studies of the pulsed impact of high-pulse ion beams on the titanium microstructure are discussed. 
461 |t Energy Fluxes and Radiation Effects (EFRE)  |o proceedings of 8th International Congress, October 2-8, 2022, Tomsk, Russia  |d 2022 
463 |t International Conference on Modification of Materials with Particle Beams and Plasma Flows (16th CMM)  |v [P. 948-954]  |d 2022 
610 1 |a электронный ресурс 
610 1 |a труды учёных ТПУ 
610 1 |a ion beam 
610 1 |a high intensity 
610 1 |a high power 
610 1 |a implantation 
610 1 |a surface modification 
610 1 |a ионные пучки 
610 1 |a имплантация 
701 1 |a Ryabchikov  |b A. I.  |c Professor of Tomsk Polytechnic University, Doctor of physical and mathematical sciences  |c physicist  |f 1950-  |g Aleksandr Ilyich  |3 (RuTPU)RU\TPU\pers\30912  |9 15150 
701 1 |a Korneva  |b O. S.  |c physicist  |c engineer of Tomsk Polytechnic University  |f 1988-  |g Olga Sergeevna  |3 (RuTPU)RU\TPU\pers\37178  |9 20156 
701 1 |a Sivin  |b D. O.  |c physicist  |c Senior researcher of Tomsk Polytechnic University, Candidate of technical sciences  |f 1978-  |g Denis Olegovich  |3 (RuTPU)RU\TPU\pers\34240  |9 17771 
701 1 |a Chernyshev  |b A. A. 
712 0 2 |a Национальный исследовательский Томский политехнический университет  |b Инженерная школа ядерных технологий  |b Научная лаборатория высокоинтенсивной имплантации ионов  |3 (RuTPU)RU\TPU\col\23698 
801 2 |a RU  |b 63413507  |c 20230222  |g RCR 
850 |a 63413507 
856 4 |u https://doi.org/10.56761/EFRE2022.C3-P-020705  |z https://doi.org/10.56761/EFRE2022.C3-P-020705 
942 |c CF