Effect of the Content of Silicon on the Optical Properties of Al-Si-N Coatings Irradiated with Carbon Ions in the Short-Pulse Implantation Mode; Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques; Vol. 16, iss. 5

Бібліографічні деталі
Parent link:Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques
Vol. 16, iss. 5.— 2022.— [P. 702-711]
Співавтори: Национальный исследовательский Томский политехнический университет Исследовательская школа физики высокоэнергетических процессов, Национальный исследовательский Томский политехнический университет Инженерная школа новых производственных технологий Научно-производственная лаборатория "Импульсно-пучковых, электроразрядных и плазменных технологий"
Інші автори: Konusov F. V. Fedor Valerievich, Pavlov S. K. Sergey Konstantinovich, Lauk A. L. Aleksandr Lukyanovich, Tarbokov V. A. Vladislav Aleksandrovich, Remnev (Remnyov) G. E. Gennady Efimovich, Gadirov R. M. Ruslan Mukhamedzhanovich
Резюме:Title screen
The effect of short-pulse irradiation with 200-keV carbon ions on the optical and electrical properties of aluminum-nitride films and Al–Si–N coatings with variable atomic composition deposited by reactive magnetron sputtering on a silicon substrate is investigated. Absorption and luminescence centers are associated with growth and radiation-induced defects in nitrides and their simplest complexes. A change in the properties during irradiation occurs due to the accumulation of radiation defects and their association into complexes. Ion irradiation is accompanied by intense radiation and the thermal annealing of unstable defects. The dose dependences of the coating characteristics indicate their high radiation resistance, which are slightly inferior to coatings on steel substrates. The radiation resistance of the coatings is due to the limiting effect of growth defects on defect formation, the wide band gap of nitrides and the interaction of defects.
Режим доступа: по договору с организацией-держателем ресурса
Мова:Англійська
Опубліковано: 2022
Предмети:
Онлайн доступ:https://doi.org/10.1134/S1027451022050081
Формат: Електронний ресурс Частина з книги
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=668661

MARC

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200 1 |a Effect of the Content of Silicon on the Optical Properties of Al-Si-N Coatings Irradiated with Carbon Ions in the Short-Pulse Implantation Mode  |f F. V. Konusov, S. K. Pavlov, A. L. Lauk [et al.] 
203 |a Text  |c electronic 
300 |a Title screen 
320 |a [References: 30 tit.] 
330 |a The effect of short-pulse irradiation with 200-keV carbon ions on the optical and electrical properties of aluminum-nitride films and Al–Si–N coatings with variable atomic composition deposited by reactive magnetron sputtering on a silicon substrate is investigated. Absorption and luminescence centers are associated with growth and radiation-induced defects in nitrides and their simplest complexes. A change in the properties during irradiation occurs due to the accumulation of radiation defects and their association into complexes. Ion irradiation is accompanied by intense radiation and the thermal annealing of unstable defects. The dose dependences of the coating characteristics indicate their high radiation resistance, which are slightly inferior to coatings on steel substrates. The radiation resistance of the coatings is due to the limiting effect of growth defects on defect formation, the wide band gap of nitrides and the interaction of defects. 
333 |a Режим доступа: по договору с организацией-держателем ресурса 
461 |t Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques 
463 |t Vol. 16, iss. 5  |v [P. 702-711]  |d 2022 
610 1 |a электронный ресурс 
610 1 |a труды учёных ТПУ 
610 1 |a aluminum nitride 
610 1 |a coatings 
610 1 |a growth defects 
610 1 |a irradiation 
610 1 |a radiation resistance 
610 1 |a radiation-induced defects 
610 1 |a absorption coefficient 
610 1 |a interband absorption 
610 1 |a band gap 
610 1 |a localized states 
610 1 |a нитрид алюминия 
610 1 |a покрытия 
610 1 |a дефекты 
610 1 |a облучение 
610 1 |a радиационная стойкость 
610 1 |a радиационные дефекты 
610 1 |a запрещенные зоны 
610 1 |a локализованные состояния 
701 1 |a Konusov  |b F. V.  |c physicist  |c Lead Engineer of Tomsk Polytechnic University, Candidate of physical and mathematical sciences  |f 1958-  |g Fedor Valerievich  |3 (RuTPU)RU\TPU\pers\32570  |9 16491 
701 1 |a Pavlov  |b S. K.  |c physicist  |c Engineer of Tomsk Polytechnic University  |f 1990-  |g Sergey Konstantinovich  |3 (RuTPU)RU\TPU\pers\32875  |9 16723 
701 1 |a Lauk  |b A. L.  |c Physicist  |c Leading engineer of Tomsk Polytechnic University  |f 1957-  |g Aleksandr Lukyanovich  |3 (RuTPU)RU\TPU\pers\37675  |9 20480 
701 1 |a Tarbokov  |b V. A.  |c specialist in the field of material science  |c Leading engineer of Tomsk Polytechnic University, Candidate of technical sciences  |f 1969-  |g Vladislav Aleksandrovich  |3 (RuTPU)RU\TPU\pers\41878  |9 21445 
701 1 |a Remnev (Remnyov)  |b G. E.  |c physicist  |c Professor of Tomsk Polytechnic University, Doctor of technical sciences  |f 1948-  |g Gennady Efimovich  |3 (RuTPU)RU\TPU\pers\31500  |9 15661 
701 1 |a Gadirov  |b R. M.  |g Ruslan Mukhamedzhanovich 
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