Magnetron Deposition of Cr Coatings with RF-ICP Assistance; Coatings; Vol. 12, iss. 10

Xehetasun bibliografikoak
Parent link:Coatings
Vol. 12, iss. 10.— 2022.— [1587, 13 p.]
Erakunde egilea: Национальный исследовательский Томский политехнический университет Инженерная школа ядерных технологий Научно-образовательный центр Б. П. Вейнберга
Beste egile batzuk: Sidelev D. V. Dmitry Vladimirovich, Grudinin V. A. Vladislav Alekseevich, Zinkovsky K. A. Konstantin Alekseevich, Alkenova K. A. Kamilla Azamatovna, Bleykher (Bleicher) G. A. Galina Alekseevna
Gaia:Title screen
The article describes a comparative analysis of chromium coatings deposited by magnetron sputtering with and without ion assistance induced by a radiofrequency inductively coupled plasma (RF-ICP) source. Four series of 2 µm-thick Cr coatings were prepared, and then their cross-sectional microstructure, crystal structure and corrosion resistance were investigated by scanning and transmission electron microscopy, X-ray diffraction and a potentiodynamic polarization method. RF-ICP assistance led to significant enhancement (almost twofold) of ion current density in a substrate. The role of RF-ICP assistance in coating properties for planetary-rotated substrates was defined in terms of ion-to-atom ratio in particle flux entering a substrate. Calculations of particle and ion flux densities revealed an increase in ion-to-atom ratio from 0.18 to 1.43 and 0.11 to 0.84 in substrate positions distant from the magnetron sputtering systems depending on their design. RF-ICP assistance is beneficial for depositing dense Cr coatings with increased corrosion resistance in a 3.5 wt.% NaCl solution. The corrosion rate of AISI 321 steel can be decreased from 6.2 × 10−6 to 4.0 × 10−8 mm/year by deposition of the dense Cr coating.
Hizkuntza:ingelesa
Argitaratua: 2022
Gaiak:
Sarrera elektronikoa:https://doi.org/10.3390/coatings12101587
Formatua: Baliabide elektronikoa Liburu kapitulua
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=668431

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330 |a The article describes a comparative analysis of chromium coatings deposited by magnetron sputtering with and without ion assistance induced by a radiofrequency inductively coupled plasma (RF-ICP) source. Four series of 2 µm-thick Cr coatings were prepared, and then their cross-sectional microstructure, crystal structure and corrosion resistance were investigated by scanning and transmission electron microscopy, X-ray diffraction and a potentiodynamic polarization method. RF-ICP assistance led to significant enhancement (almost twofold) of ion current density in a substrate. The role of RF-ICP assistance in coating properties for planetary-rotated substrates was defined in terms of ion-to-atom ratio in particle flux entering a substrate. Calculations of particle and ion flux densities revealed an increase in ion-to-atom ratio from 0.18 to 1.43 and 0.11 to 0.84 in substrate positions distant from the magnetron sputtering systems depending on their design. RF-ICP assistance is beneficial for depositing dense Cr coatings with increased corrosion resistance in a 3.5 wt.% NaCl solution. The corrosion rate of AISI 321 steel can be decreased from 6.2 × 10−6 to 4.0 × 10−8 mm/year by deposition of the dense Cr coating. 
461 |t Coatings 
463 |t Vol. 12, iss. 10  |v [1587, 13 p.]  |d 2022 
610 1 |a электронный ресурс 
610 1 |a труды учёных ТПУ 
610 1 |a magnetron sputtering 
610 1 |a Cr coatings 
610 1 |a corrosion resistance 
610 1 |a RF-ICP assistance 
610 1 |a cross-sectional microstructure 
610 1 |a crystal structure 
610 1 |a магнетронное напыление 
610 1 |a хромовые покрытия 
610 1 |a устойчивость 
610 1 |a коррозии 
610 1 |a поперечное сечение 
701 1 |a Sidelev  |b D. V.  |c physicist  |c Associate Professor of Tomsk Polytechnic University, Candidate of Technical Sciences  |f 1991-  |g Dmitry Vladimirovich  |y Tomsk  |3 (RuTPU)RU\TPU\pers\34524  |9 17905 
701 1 |a Grudinin  |b V. A.  |c physicist  |c engineer of Tomsk Polytechnic University  |f 1995-  |g Vladislav Alekseevich  |3 (RuTPU)RU\TPU\pers\42519  |9 21548 
701 1 |a Zinkovsky  |b K. A.  |c specialist in the field of nuclear technologies  |c engineer of Tomsk Polytechnic University  |f 2000-  |g Konstantin Alekseevich  |3 (RuTPU)RU\TPU\pers\47391 
701 1 |a Alkenova  |b K. A.  |g Kamilla Azamatovna 
701 1 |a Bleykher (Bleicher)  |b G. A.  |c physicist  |c Professor of Tomsk Polytechnic University, Doctor of Physical and Mathematical Sciences  |f 1961-  |g Galina Alekseevna  |3 (RuTPU)RU\TPU\pers\31496  |9 15657 
712 0 2 |a Национальный исследовательский Томский политехнический университет  |b Инженерная школа ядерных технологий  |b Научно-образовательный центр Б. П. Вейнберга  |3 (RuTPU)RU\TPU\col\23561  |9 28358 
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