Kinetics of plasma-assisted chemical vapor deposition combined with inductively excited RF discharge and properties of a-C:H:SiOx coatings; Vacuum; Vol. 199

Kinetics of plasma-assisted chemical vapor deposition combined with inductively excited RF discharge and properties of a-C:H:SiOx coatings; Vacuum; Vol. 199

Dettagli Bibliografici
Parent link:	Vacuum Vol. 199.— 2022.— [110982, 9 p.]
Ente Autore:	Национальный исследовательский Томский политехнический университет Инженерная школа ядерных технологий Отделение экспериментальной физики
Altri autori:	Grenadyorov A. S. Aleksandr Sergeevich, Oskirko V. O. Vladimir Olegovich, Solovjev A. A. Andrey Aleksandrovich, Semenov V. A. Vyacheslav Arkadjevich, Rabotkin S. V. Sergey Viktorovich, Oskomov K. V. Konstantin Vladimirovich, Sypchenko V. S. Vladimir Sergeevich
Riassunto:	Title screen The paper studies the plasma-assisted chemical vapor deposition of a-C:H:SiOx coatings in plasma of non-self-sustained arc discharge with a hot cathode combined with inductively excited radio-frequency (RF) discharge. The a-C:H:SiOx coatings are produced by polyphenyl methylsiloxane (PPMS) dissociation in plasma with and without RF discharge. The optical emission spectroscopy is used to study the PPMS dissociation process. Raman spectroscopy provides the structural investigations of the obtained coatings, while the energy dispersive X-ray spectroscopy is used to analyze the chemical composition. It is shown that the mechanical and tribological properties of a-C:H:SiOx coatings depend on the RF discharge power and the bias voltage amplitude of the substrate. It is demonstrated that substrate bias voltage can be reduced during the coating deposition in combined discharge without significant degradation of its mechanical and tribological properties due to the better dissociation and ionization of PPMS vapor molecules in inductively excited RF discharge. Режим доступа: по договору с организацией-держателем ресурса
Lingua:	inglese
Pubblicazione:	2022
Soggetti:	электронный ресурс труды учёных ТПУ plasma-assisted chemical vapor deposition polyphenyl methylsiloxane a-C:H:SiOx coating hardness wear resistance optical emission spectroscopy покрытия твердость износостойкость оптическая спектроскопия химическое осаждение
Accesso online:	https://doi.org/10.1016/j.vacuum.2022.110982
Natura:	Elettronico Capitolo di libro
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=667876

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