Hot target magnetron sputtering enhanced by RF-ICP source: Microstructure and functional properties of CrNx coatings; Vacuum; Vol. 200

Hot target magnetron sputtering enhanced by RF-ICP source: Microstructure and functional properties of CrNx coatings; Vacuum; Vol. 200

Библиографические подробности
Источник:	Vacuum Vol. 200.— 2022.— [111020, 12 p.]
Корпоративные авторы:	Национальный исследовательский Томский политехнический университет Инженерная школа ядерных технологий, Национальный исследовательский Томский политехнический университет Исследовательская школа химических и биомедицинских технологий
Другие авторы:	Grudinin V. A. Vladislav Alekseevich, Bleykher (Bleicher) G. A. Galina Alekseevna, Krivobokov V. P. Valery Pavlovich, Semyonov O. V. Oleg Vladimirovich, Obrosov A. Aleksey, Weifs S. Sabine, Sidelev D. V. Dmitry Vladimirovich
Примечания:	Title screen CrNx coatings were deposited at high rates (100–130 nm/min) using hot Cr target magnetron sputtering enhanced by a radio-frequency inductively coupled plasma (RF-ICP) source in an Ar + N2 atmosphere. Besides separation of inert and reactive atmosphere, the RF-ICP source can be an effective tool for ion assistance in case of coating growth and to tailor film parameters. The effects of nitrogen flow rate and substrate bias potential on microstructure and functional properties of the CrNx coatings were investigated. An increase in nitrogen flow rate favored the formation of a looser microstructure of the coatings, while substrate biasing had the opposite effect. The functional properties were strongly dependent on the phase composition of the CrNx coatings. The change in coating microstructure significantly affected hardness, elastic modulus, adhesion, friction coefficients and corrosion resistance. The results indicated that ion assistance can be a key feature for regulating functional properties in the considered type of coating deposition. Cr2N and CrN compound coatings with high hardness (~20 GPa) and low corrosion current density (icorr ~ 3–5·10?9 A/cm2) in a 3.5 wt% NaCl solution were obtained by high-rate deposition. Режим доступа: по договору с организацией-держателем ресурса
Язык:	английский
Опубликовано:	2022
Предметы:	электронный ресурс труды учёных ТПУ CrN coatings hot target magnetron sputtering high-rate deposition RF-ICP покрытия магнетронные напыления высокоскоростное осаждение мишени микроструктуры функциональные свойства
Online-ссылка:	https://doi.org/10.1016/j.vacuum.2022.111020
Формат:	Электронный ресурс Статья
Запись в KOHA:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=667757

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