Effect of nitrogen content on structural and mechanical properties of AlTiZrTaHf(-N) high entropy films deposited by reactive magnetron sputtering

Effect of nitrogen content on structural and mechanical properties of AlTiZrTaHf(-N) high entropy films deposited by reactive magnetron sputtering

Bibliografiset tiedot
Parent link:Surface and Coatings Technology
Vol. 432.— 2022.— [128051, 8 p.]
Yhteisötekijä: Национальный исследовательский Томский политехнический университет Исследовательская школа химических и биомедицинских технологий
Muut tekijät: El Garah M. Mohamed, Djallel Eddine Touaibia, Sofiane Achache, Michau A. Alexandre, Sviridova E. V. Elizaveta Vitaljevna, Postnikov P. S. Pavel Sergeevich, Chehimi Mohamed Mehdi, Schuster F. Frederic, Sanchette F. Frederic
Yhteenveto:Title screen
There is a growing interest in the design of high entropy alloys due to their remarkable properties and applications in various fields such as aerospace, medical and automotive. AlTiTaZrHf(-N) high entropy metal-sublattice nitrides were deposited in various argon-nitrogen gas mixtures on glass and silicon substrates. X-ray diffraction analyses reveal a transition from amorphous to an FCC single phase by increasing the nitrogen content. The films have compact or columnar morphology depending on the nitrogen flow rate. Energy dispersive spectroscopy analysis shows a decreasing of the matals content as the nitrogen flow rates ratio RN2 = N2/Ar + N2 increases. XPS surface analysis reveal the formation of nitrides when the nitrogen is introduced. Evolution of hardness and Young's modulus are discussed and the maximum values are obtained for a flow rates ratio RN2 of 10% at 27.67 GPa and 205.56 GPa respectively. The same film reveals good tribological properties compared to other films. This work conclusively demonstrates that high entropy metal-sublattice nitrides can be generated in an efficient way with tunable properties.
Режим доступа: по договору с организацией-держателем ресурса
Julkaistu: 2022
Aiheet:
электронный ресурс
труды учёных ТПУ
thin films
high entropy nitrides
magnetron sputtering
surface analysis
тонкие пленки
магнетронное напыление
нитриды
Linkit:https://doi.org/10.1016/j.surfcoat.2021.128051
Aineistotyyppi: Elektroninen Kirjan osa
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=667671

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