Solid particle erosion of CVD diamond films deposited at different methane concentration; Wear; Vol. 494-495

Solid particle erosion of CVD diamond films deposited at different methane concentration; Wear; Vol. 494-495

Xehetasun bibliografikoak
Parent link:	Wear Vol. 494-495.— 2022.— [204239, 5 p.]
Egile korporatiboa:	Национальный исследовательский Томский политехнический университет Исследовательская школа физики высокоэнергетических процессов, Национальный исследовательский Томский политехнический университет Инженерная школа новых производственных технологий Научно-производственная лаборатория "Импульсно-пучковых, электроразрядных и плазменных технологий"
Beste egile batzuk:	Gaydaychuk A. V. Alexander Valerievich, Linnik S. A. Stepan Andreevich, Mitulinsky A. S. Aleksandr Sergeevich, Zenkin S. P. Sergey Petrovich
Gaia:	Title screen Thick diamond films are synthesized on Si substrate by HFCVD method with different methane concentration (up to 21.9 vol %) in the gas mixture. The erosion resistance of the obtained coatings was investigated by the solid particle erosion of SiC. We show that, regardless of the microstructure, diamond coatings exhibit the same erosion mechanisms. Ring and radial cracks, as well as pin-holes and a local delamination of diamond film were detected for all synthesized films. We found that despite the high degree of initial roughness, the microcrystalline diamond coating showed the maximum erosion resistance at all stages of erosion experiments. Режим доступа: по договору с организацией-держателем ресурса
Hizkuntza:	ingelesa
Argitaratua:	2022
Gaiak:	труды учёных ТПУ электронный ресурс diamond film erosion wear HFCVD алмазные пленки эрозионный износ
Sarrera elektronikoa:	https://doi.org/10.1016/j.wear.2022.204239
Formatua:	Baliabide elektronikoa Liburu kapitulua
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=667193

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