Low-energy high-current plasma immersion implantation of nitrogen ions in plasma of non-self-sustained arc discharge with thermionic and hollow cathodes; Surface and Coatings Technology; Vol. 340

Dettagli Bibliografici
Parent link:Surface and Coatings Technology
Vol. 340.— 2018.— [P. 152-158]
Ente Autore: Национальный исследовательский Томский политехнический университет Инженерная школа ядерных технологий Научная лаборатория высокоинтенсивной имплантации ионов
Altri autori: Koval N. N. Nikolay Nikolaevich, Ryabchikov A. I. Aleksandr Ilyich, Sivin D. O. Denis Olegovich, Lopatin I. V. Iljya Viktorovich, Krysina O. V. Olga Vasiljevna, Akhmadeev Yu. Kh. Yury Khalyafovich, Ignatov D. Yu. Danil Yurjevich
Riassunto:Title screen
This paper presents the results of low-energy high-current implantation of nitrogen ions into AISI 5140 steel. The plasma was generated using a plasma source based on non-self-sustained arc discharge, using thermionic and hollow cathodes. The influence of the temperature of the specimens and irradiation dose on the characteristics of the ion-modified layer was studied. The temperature of the specimens was controlled within the range of (450–650) °C by changing the duty factor of the bias pulse and the average ion current density. The microhardness of the steel after 1-hour of low-energy high-current implantation of nitrogen ions increased almost 2-fold (up to 7100 MPa), and a modified layer with a thickness up to 200 [mu]m was formed. The wear resistance increased 7.5-fold. The main factor determining the efficiency of nitrogen dopant penetration was the temperature of the specimen. The parameters of the ion treatment influence the shape of the hardness distribution profile and the efficiency of ion cleaning of the surface.
Режим доступа: по договору с организацией-держателем ресурса
Lingua:inglese
Pubblicazione: 2018
Soggetti:
Accesso online:https://doi.org/10.1016/j.surfcoat.2018.02.064
Natura: MixedMaterials Elettronico Capitolo di libro
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=667146

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200 1 |a Low-energy high-current plasma immersion implantation of nitrogen ions in plasma of non-self-sustained arc discharge with thermionic and hollow cathodes  |f N. N. Koval, A. I. Ryabchikov, D. O. Sivin [et al.] 
203 |a Text  |c electronic 
300 |a Title screen 
320 |a [References: 26 tit.] 
330 |a This paper presents the results of low-energy high-current implantation of nitrogen ions into AISI 5140 steel. The plasma was generated using a plasma source based on non-self-sustained arc discharge, using thermionic and hollow cathodes. The influence of the temperature of the specimens and irradiation dose on the characteristics of the ion-modified layer was studied. The temperature of the specimens was controlled within the range of (450–650) °C by changing the duty factor of the bias pulse and the average ion current density. The microhardness of the steel after 1-hour of low-energy high-current implantation of nitrogen ions increased almost 2-fold (up to 7100 MPa), and a modified layer with a thickness up to 200 [mu]m was formed. The wear resistance increased 7.5-fold. The main factor determining the efficiency of nitrogen dopant penetration was the temperature of the specimen. The parameters of the ion treatment influence the shape of the hardness distribution profile and the efficiency of ion cleaning of the surface. 
333 |a Режим доступа: по договору с организацией-держателем ресурса 
461 |t Surface and Coatings Technology 
463 |t Vol. 340  |v [P. 152-158]  |d 2018 
610 1 |a электронный ресурс 
610 1 |a труды учёных ТПУ 
610 1 |a low-energy high-current ion implantation 
610 1 |a plasma immersion nitriding 
610 1 |a non-self-sustained arc discharge 
610 1 |a plasma source 
610 1 |a thermionic and hollow cathodes 
610 1 |a hardness 
610 1 |a elemental composition 
610 1 |a ионная имплантация 
610 1 |a азотирование 
610 1 |a дуговые разряды 
610 1 |a источники плазмы 
610 1 |a катоды 
610 1 |a твердость 
610 1 |a элементный состав 
701 1 |a Koval  |b N. N.  |c specialist in the field of electronics  |c Professor of Tomsk Polytechnic University, Doctor of technical sciences  |f 1948-  |g Nikolay Nikolaevich  |3 (RuTPU)RU\TPU\pers\34748 
701 1 |a Ryabchikov  |b A. I.  |c Professor of Tomsk Polytechnic University, Doctor of physical and mathematical sciences  |c physicist  |f 1950-  |g Aleksandr Ilyich  |3 (RuTPU)RU\TPU\pers\30912 
701 1 |a Sivin  |b D. O.  |c physicist  |c Senior researcher of Tomsk Polytechnic University, Candidate of technical sciences  |f 1978-  |g Denis Olegovich  |3 (RuTPU)RU\TPU\pers\34240 
701 1 |a Lopatin  |b I. V.  |g Iljya Viktorovich 
701 1 |a Krysina  |b O. V.  |g Olga Vasiljevna 
701 1 |a Akhmadeev  |b Yu. Kh.  |g Yury Khalyafovich 
701 1 |a Ignatov  |b D. Yu.  |g Danil Yurjevich 
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