Low-energy high-current plasma immersion implantation of nitrogen ions in plasma of non-self-sustained arc discharge with thermionic and hollow cathodes; Surface and Coatings Technology; Vol. 340
| Parent link: | Surface and Coatings Technology Vol. 340.— 2018.— [P. 152-158] |
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| Ente Autore: | |
| Altri autori: | , , , , , , |
| Riassunto: | Title screen This paper presents the results of low-energy high-current implantation of nitrogen ions into AISI 5140 steel. The plasma was generated using a plasma source based on non-self-sustained arc discharge, using thermionic and hollow cathodes. The influence of the temperature of the specimens and irradiation dose on the characteristics of the ion-modified layer was studied. The temperature of the specimens was controlled within the range of (450–650) °C by changing the duty factor of the bias pulse and the average ion current density. The microhardness of the steel after 1-hour of low-energy high-current implantation of nitrogen ions increased almost 2-fold (up to 7100 MPa), and a modified layer with a thickness up to 200 [mu]m was formed. The wear resistance increased 7.5-fold. The main factor determining the efficiency of nitrogen dopant penetration was the temperature of the specimen. The parameters of the ion treatment influence the shape of the hardness distribution profile and the efficiency of ion cleaning of the surface. Режим доступа: по договору с организацией-держателем ресурса |
| Lingua: | inglese |
| Pubblicazione: |
2018
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| Soggetti: | |
| Accesso online: | https://doi.org/10.1016/j.surfcoat.2018.02.064 |
| Natura: | MixedMaterials Elettronico Capitolo di libro |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=667146 |
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| 200 | 1 | |a Low-energy high-current plasma immersion implantation of nitrogen ions in plasma of non-self-sustained arc discharge with thermionic and hollow cathodes |f N. N. Koval, A. I. Ryabchikov, D. O. Sivin [et al.] | |
| 203 | |a Text |c electronic | ||
| 300 | |a Title screen | ||
| 320 | |a [References: 26 tit.] | ||
| 330 | |a This paper presents the results of low-energy high-current implantation of nitrogen ions into AISI 5140 steel. The plasma was generated using a plasma source based on non-self-sustained arc discharge, using thermionic and hollow cathodes. The influence of the temperature of the specimens and irradiation dose on the characteristics of the ion-modified layer was studied. The temperature of the specimens was controlled within the range of (450–650) °C by changing the duty factor of the bias pulse and the average ion current density. The microhardness of the steel after 1-hour of low-energy high-current implantation of nitrogen ions increased almost 2-fold (up to 7100 MPa), and a modified layer with a thickness up to 200 [mu]m was formed. The wear resistance increased 7.5-fold. The main factor determining the efficiency of nitrogen dopant penetration was the temperature of the specimen. The parameters of the ion treatment influence the shape of the hardness distribution profile and the efficiency of ion cleaning of the surface. | ||
| 333 | |a Режим доступа: по договору с организацией-держателем ресурса | ||
| 461 | |t Surface and Coatings Technology | ||
| 463 | |t Vol. 340 |v [P. 152-158] |d 2018 | ||
| 610 | 1 | |a электронный ресурс | |
| 610 | 1 | |a труды учёных ТПУ | |
| 610 | 1 | |a low-energy high-current ion implantation | |
| 610 | 1 | |a plasma immersion nitriding | |
| 610 | 1 | |a non-self-sustained arc discharge | |
| 610 | 1 | |a plasma source | |
| 610 | 1 | |a thermionic and hollow cathodes | |
| 610 | 1 | |a hardness | |
| 610 | 1 | |a elemental composition | |
| 610 | 1 | |a ионная имплантация | |
| 610 | 1 | |a азотирование | |
| 610 | 1 | |a дуговые разряды | |
| 610 | 1 | |a источники плазмы | |
| 610 | 1 | |a катоды | |
| 610 | 1 | |a твердость | |
| 610 | 1 | |a элементный состав | |
| 701 | 1 | |a Koval |b N. N. |c specialist in the field of electronics |c Professor of Tomsk Polytechnic University, Doctor of technical sciences |f 1948- |g Nikolay Nikolaevich |3 (RuTPU)RU\TPU\pers\34748 | |
| 701 | 1 | |a Ryabchikov |b A. I. |c Professor of Tomsk Polytechnic University, Doctor of physical and mathematical sciences |c physicist |f 1950- |g Aleksandr Ilyich |3 (RuTPU)RU\TPU\pers\30912 | |
| 701 | 1 | |a Sivin |b D. O. |c physicist |c Senior researcher of Tomsk Polytechnic University, Candidate of technical sciences |f 1978- |g Denis Olegovich |3 (RuTPU)RU\TPU\pers\34240 | |
| 701 | 1 | |a Lopatin |b I. V. |g Iljya Viktorovich | |
| 701 | 1 | |a Krysina |b O. V. |g Olga Vasiljevna | |
| 701 | 1 | |a Akhmadeev |b Yu. Kh. |g Yury Khalyafovich | |
| 701 | 1 | |a Ignatov |b D. Yu. |g Danil Yurjevich | |
| 712 | 0 | 2 | |a Национальный исследовательский Томский политехнический университет |b Инженерная школа ядерных технологий |b Научная лаборатория высокоинтенсивной имплантации ионов |3 (RuTPU)RU\TPU\col\23698 |
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