Features of the Formation of Ultralow Energy High-Intensity Metal and Gaseous Ion Beams; IEEE Transactions on Plasma Science; Vol. 49, iss. 9

Bibliografiske detaljer
Parent link:IEEE Transactions on Plasma Science
Vol. 49, iss. 9.— 2021.— [P. 2559-2566]
Institution som forfatter: Национальный исследовательский Томский политехнический университет Инженерная школа ядерных технологий Научная лаборатория высокоинтенсивной имплантации ионов
Andre forfattere: Ryabchikov A. I. Aleksandr Ilyich, Dektyarev S. V. Sergey Valentinovich, Korneva O. S. Olga Sergeevna, Sivin D. O. Denis Olegovich
Summary:Title screen
This article studies the features and patterns of the formation of high-intensity beams of metal and gaseous ions of low and ultralow energy from dc vacuum arc and gas-discharge plasma. It presents the results of repetitively pulsed plasma immersion extraction of aluminum, titanium, and nitrogen ions from the plasma followed by the formation and transport of ion beam under conditions of its ballistic focusing. This article presents the experimental data on the influence of the grid focusing electrode cell sizes of 150 and 500 ?m , the bias potential amplitude from 0.1 to 2 kV, the conditions for neutralizing the space charge of the beam during preliminary plasma injection into drift space and when using an additional thermoelectron source on the transport and focusing of ion beams. Here, it discusses the effect of the characteristic dimensions of the fine-structured grid and plasma parameters at ultralow bias potential amplitudes and the presence of significant initial energy in ions on the ion beam focusing. It was found that at bias potential amplitudes of 0.6 kV, it is possible to form repetitively pulsed ion beams with high current density reaching 170 mA/cm 2 . The obtaining of such beams opens up the possibility of implementing the method of high-intensity ion implantation under conditions of multiple decreases in the irradiated surface sputtering.
Sprog:engelsk
Udgivet: 2021
Fag:
Online adgang:https://doi.org/10.1109/TPS.2021.3083327
Format: Electronisk Book Chapter
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=667108

MARC

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200 1 |a Features of the Formation of Ultralow Energy High-Intensity Metal and Gaseous Ion Beams  |f A. I. Ryabchikov, S. V. Dektyarev, O. S. Korneva, D. O. Sivin 
300 |a Title screen 
320 |a [References: 51 tit.] 
330 |a This article studies the features and patterns of the formation of high-intensity beams of metal and gaseous ions of low and ultralow energy from dc vacuum arc and gas-discharge plasma. It presents the results of repetitively pulsed plasma immersion extraction of aluminum, titanium, and nitrogen ions from the plasma followed by the formation and transport of ion beam under conditions of its ballistic focusing. This article presents the experimental data on the influence of the grid focusing electrode cell sizes of 150 and 500 ?m , the bias potential amplitude from 0.1 to 2 kV, the conditions for neutralizing the space charge of the beam during preliminary plasma injection into drift space and when using an additional thermoelectron source on the transport and focusing of ion beams. Here, it discusses the effect of the characteristic dimensions of the fine-structured grid and plasma parameters at ultralow bias potential amplitudes and the presence of significant initial energy in ions on the ion beam focusing. It was found that at bias potential amplitudes of 0.6 kV, it is possible to form repetitively pulsed ion beams with high current density reaching 170 mA/cm 2 . The obtaining of such beams opens up the possibility of implementing the method of high-intensity ion implantation under conditions of multiple decreases in the irradiated surface sputtering. 
461 |t IEEE Transactions on Plasma Science 
463 |t Vol. 49, iss. 9  |v [P. 2559-2566]  |d 2021 
610 1 |a электронный ресурс 
610 1 |a труды учёных ТПУ 
610 1 |a ions 
610 1 |a ion beams 
610 1 |a electric potential 
610 1 |a electrodes 
610 1 |a particle beams 
610 1 |a focusing 
610 1 |a metals 
610 1 |a ионы 
610 1 |a ионные пучки 
610 1 |a электроды 
610 1 |a электрический потенциал 
610 1 |a фокусировка 
610 1 |a металлы 
701 1 |a Ryabchikov  |b A. I.  |c Professor of Tomsk Polytechnic University, Doctor of physical and mathematical sciences  |c physicist  |f 1950-  |g Aleksandr Ilyich  |3 (RuTPU)RU\TPU\pers\30912 
701 1 |a Dektyarev  |b S. V.  |c physicist  |c design engineer of Tomsk Polytechnic University  |f 1957-  |g Sergey Valentinovich  |3 (RuTPU)RU\TPU\pers\35672 
701 1 |a Korneva  |b O. S.  |c physicist  |c engineer of Tomsk Polytechnic University  |f 1988-  |g Olga Sergeevna  |3 (RuTPU)RU\TPU\pers\37178  |9 20156 
701 1 |a Sivin  |b D. O.  |c physicist  |c Senior researcher of Tomsk Polytechnic University, Candidate of technical sciences  |f 1978-  |g Denis Olegovich  |3 (RuTPU)RU\TPU\pers\34240 
712 0 2 |a Национальный исследовательский Томский политехнический университет  |b Инженерная школа ядерных технологий  |b Научная лаборатория высокоинтенсивной имплантации ионов  |3 (RuTPU)RU\TPU\col\23698 
801 2 |a RU  |b 63413507  |c 20220222  |g RCR 
856 4 |u https://doi.org/10.1109/TPS.2021.3083327 
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