Talbot photolithography optimization with engineered hybrid metal-dielectric mask: High-contrast and highly-uniform Talbot stripes; Optics and Laser Technology; Vol. 148
| Parent link: | Optics and Laser Technology Vol. 148.— 2022.— [107776, 8 p.] |
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| Autor principal: | |
| Autor corporatiu: | |
| Altres autors: | , |
| Sumari: | Title screen Conventional projection Talbot lithography usually employs opaque (amplitude) or transparent (phase) masks for creating a periodic array of Fresnel diffraction fringes in the photosensitive substrate. For particular mask design the longitudinal periodicity of Talbot carpet can be avoided producing quasi uniform striped pattern (Talbot stripes). We propose a novel hybrid amplitude-phase mask which is engineered for obtaining extremely smooth Talbot stripes and simultaneously high lateral optical contrast and extreme spatial resolution better than a third of laser wavelength. By means of the numerical simulations, we demonstrate the robustness of produced striped diffraction patterns against mask design deviation and light incidence angle variations. The reproducibility of the Talbot stripes is reported also for 1D and 2D metal-dielectric projection masks. Режим доступа: по договору с организацией-держателем ресурса |
| Idioma: | anglès |
| Publicat: |
2022
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| Matèries: | |
| Accés en línia: | https://doi.org/10.1016/j.optlastec.2021.107776 |
| Format: | MixedMaterials Electrònic Capítol de llibre |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=666418 |
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| 200 | 1 | |a Talbot photolithography optimization with engineered hybrid metal-dielectric mask: High-contrast and highly-uniform Talbot stripes |f Yu. E. Geynts, I. V. Minin, O. V. Minin | |
| 203 | |a Text |c electronic | ||
| 300 | |a Title screen | ||
| 320 | |a [References: 32 tit.] | ||
| 330 | |a Conventional projection Talbot lithography usually employs opaque (amplitude) or transparent (phase) masks for creating a periodic array of Fresnel diffraction fringes in the photosensitive substrate. For particular mask design the longitudinal periodicity of Talbot carpet can be avoided producing quasi uniform striped pattern (Talbot stripes). We propose a novel hybrid amplitude-phase mask which is engineered for obtaining extremely smooth Talbot stripes and simultaneously high lateral optical contrast and extreme spatial resolution better than a third of laser wavelength. By means of the numerical simulations, we demonstrate the robustness of produced striped diffraction patterns against mask design deviation and light incidence angle variations. The reproducibility of the Talbot stripes is reported also for 1D and 2D metal-dielectric projection masks. | ||
| 333 | |a Режим доступа: по договору с организацией-держателем ресурса | ||
| 461 | |t Optics and Laser Technology | ||
| 463 | |t Vol. 148 |v [107776, 8 p.] |d 2022 | ||
| 610 | 1 | |a электронный ресурс | |
| 610 | 1 | |a труды учёных ТПУ | |
| 610 | 1 | |a Talbot lithography | |
| 610 | 1 | |a wavelength-scaled diffraction grating | |
| 610 | 1 | |a optical contrast | |
| 610 | 1 | |a projection mask | |
| 610 | 1 | |a литография | |
| 610 | 1 | |a дифракционные решетки | |
| 610 | 1 | |a масштабирование | |
| 610 | 1 | |a оптический контраст | |
| 610 | 1 | |a фотолитография | |
| 610 | 1 | |a полосы Тальбота | |
| 700 | 1 | |a Geynts |b Yu. E. |g Yury Elmarovich | |
| 701 | 1 | |a Minin |b I. V. |c physicist |c Professor of Tomsk Polytechnic University, Doctor of technical sciences |f 1960- |g Igor Vladilenovich |3 (RuTPU)RU\TPU\pers\37571 | |
| 701 | 1 | |a Minin |b O. V. |c physicist |c professor of Tomsk Polytechnic University, Doctor of technical sciences |f 1960- |g Oleg Vladilenovich |3 (RuTPU)RU\TPU\pers\44941 | |
| 712 | 0 | 2 | |a Национальный исследовательский Томский политехнический университет |b Инженерная школа неразрушающего контроля и безопасности |b Отделение электронной инженерии |3 (RuTPU)RU\TPU\col\23507 |
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| 856 | 4 | |u https://doi.org/10.1016/j.optlastec.2021.107776 | |
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