APA (7th ed.) Citation

Geynts Yu. E. Yury Elmarovich, Minin I. V. Igor Vladilenovich, & Minin O. V. Oleg Vladilenovich. (2022). Talbot photolithography optimization with engineered hybrid metal-dielectric mask: High-contrast and highly-uniform Talbot stripes. 2022. https://doi.org/10.1016/j.optlastec.2021.107776

Chicago Style (17th ed.) Citation

Geynts Yu. E. Yury Elmarovich, Minin I. V. Igor Vladilenovich, and Minin O. V. Oleg Vladilenovich. Talbot Photolithography Optimization with Engineered Hybrid Metal-dielectric Mask: High-contrast and Highly-uniform Talbot Stripes. 2022, 2022. https://doi.org/10.1016/j.optlastec.2021.107776.

MLA (9th ed.) Citation

Geynts Yu. E. Yury Elmarovich, et al. Talbot Photolithography Optimization with Engineered Hybrid Metal-dielectric Mask: High-contrast and Highly-uniform Talbot Stripes. 2022, 2022. https://doi.org/10.1016/j.optlastec.2021.107776.