Preparation and Electron-Beam Surface Modification of Novel TiNi Material for Medical Applications
| Parent link: | Applied Sciences Vol. 11, iss. 10.— 2021.— [4372, 14 p.] |
|---|---|
| Autor corporatiu: | |
| Altres autors: | , , , , , , , , |
| Sumari: | Title screen A new approach to fabricate TiNi surfaces combining the advantages of both monolithic and porous materials for implants is used in this work. New materials were obtained by depositing a porous TiNi powder onto monolithic TiNi plates followed by sintering at 1200 °C. Then, further modification of the material surface with a high-current-pulsed electron beam (HCPEB) was carried out. Three materials obtained (one after sintering and two after subsequent beam treatment by 30 pulses with different pulse energy) were studied by XRD, SEM, EDX, surface profilometry, and by means of electrochemical measurements, including OCP and EIS. Structural and compositional changes caused by HCPEB treatment were investigated. Surface properties of the samples during their storage in saline for 10 days were studied and a model experiment with cell growth (MCF-7) was carried out for the unmodified sample with an electron beam to detect cell appearance on different surface locations. |
| Idioma: | anglès |
| Publicat: |
2021
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| Matèries: | |
| Accés en línia: | http://earchive.tpu.ru/handle/11683/71099 https://doi.org/10.3390/app11104372 |
| Format: | Electrònic Capítol de llibre |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=666382 |
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| 200 | 1 | |a Preparation and Electron-Beam Surface Modification of Novel TiNi Material for Medical Applications |f S. G. Anikeev, A. V. Shabalina, S. A. Kulinich [et al.] | |
| 203 | |a Text |c electronic | ||
| 300 | |a Title screen | ||
| 320 | |a [References: 40 tit.] | ||
| 330 | |a A new approach to fabricate TiNi surfaces combining the advantages of both monolithic and porous materials for implants is used in this work. New materials were obtained by depositing a porous TiNi powder onto monolithic TiNi plates followed by sintering at 1200 °C. Then, further modification of the material surface with a high-current-pulsed electron beam (HCPEB) was carried out. Three materials obtained (one after sintering and two after subsequent beam treatment by 30 pulses with different pulse energy) were studied by XRD, SEM, EDX, surface profilometry, and by means of electrochemical measurements, including OCP and EIS. Structural and compositional changes caused by HCPEB treatment were investigated. Surface properties of the samples during their storage in saline for 10 days were studied and a model experiment with cell growth (MCF-7) was carried out for the unmodified sample with an electron beam to detect cell appearance on different surface locations. | ||
| 461 | |t Applied Sciences | ||
| 463 | |t Vol. 11, iss. 10 |v [4372, 14 p.] |d 2021 | ||
| 610 | 1 | |a электронный ресурс | |
| 610 | 1 | |a труды учёных ТПУ | |
| 610 | 1 | |a TiNi | |
| 610 | 1 | |a high-current pulsed electron beam | |
| 610 | 1 | |a porous coating | |
| 610 | 1 | |a surface modification | |
| 610 | 1 | |a EIS in saline | |
| 610 | 1 | |a cell growth | |
| 610 | 1 | |a электронные публикации | |
| 610 | 1 | |a пористые покрытия | |
| 701 | 1 | |a Anikeev |b S. G. | |
| 701 | 1 | |a Shabalina |b A. V. |g Anastasiya Valerjevna | |
| 701 | 1 | |a Kulinich |b S. A. |g Sergei | |
| 701 | 1 | |a Artyukhova |b N. V. |g Nadezhda Viktorovna | |
| 701 | 1 | |a Korsakova |b D. R. |g Darjya Ruslanovna | |
| 701 | 1 | |a Yakovlev |b E. V. |g Evgeny Vitaljevich | |
| 701 | 1 | |a Vlasov |b V. A. |c Physicist |c Senior researcher of Tomsk Polytechnic University, Candidate of physical and mathematical sciences |f 1975- |g Vitaliy Anatolievich |3 (RuTPU)RU\TPU\pers\31405 |9 15577 | |
| 701 | 1 | |a Kokorev |b O. V. |g Oleg Viktorovich | |
| 701 | 1 | |a Khodorenko |b V. N. |g Valentina Nikolaevna | |
| 712 | 0 | 2 | |a Национальный исследовательский Томский политехнический университет |b Институт неразрушающего контроля |b Проблемная научно-исследовательская лаборатория электроники, диэлектриков и полупроводников |3 (RuTPU)RU\TPU\col\19033 |
| 801 | 2 | |a RU |b 63413507 |c 20220607 |g RCR | |
| 856 | 4 | |u http://earchive.tpu.ru/handle/11683/71099 | |
| 856 | 4 | |u https://doi.org/10.3390/app11104372 | |
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