Influence of Nitrogen on Corrosion Resistance of Thin Ti–O–N Films Deposited by Reactive Magnetron Sputtering; Inorganic Materials: Applied Research; Vol. 12, iss. 4

Influence of Nitrogen on Corrosion Resistance of Thin Ti–O–N Films Deposited by Reactive Magnetron Sputtering; Inorganic Materials: Applied Research; Vol. 12, iss. 4

Dettagli Bibliografici
Parent link:	Inorganic Materials: Applied Research=Материаловедение.— .— New York: Springer Science+Business Media LLC. Vol. 12, iss. 4.— 2021.— P. 1033-1036
Autore principale:	Boytsova E. L. Elena Lvovna
Altri autori:	Voroshilov F. A. Fedor Anatolievich, Leonova L. A. Liliya Aleksandrovna
Riassunto:	Title screen The effect of introducing nitrogen into the reaction mixture during magnetron sputtering on the corrosion-electrochemical behavior of Ti-O-N films is studied using electrochemical and gravimetric methods. Polarization studies of electrochemical dissolution of films in an aqueous solution of 3% NaCl in a potentiostatic mode are presented. It is found that, upon dissolution of films, areas of passivation, activation, and trans-passivation of the coating surface associated with the formation of oxide films and titanium chlorides on the sample surface are observed. It is proved that thin films obtained with a high nitrogen content exhibit higher corrosion resistance. The main values of corrosion, namely, mass, depth, and current indicators, are calculated Текстовый файл AM_Agreement
Lingua:	inglese
Pubblicazione:	2021
Soggetti:	электронный ресурс труды учёных ТПУ nanofilms titanium dioxide doping with nitrogen chemical resistance corrosion resistance gravimetry magnetron sputtering
Accesso online:	https://doi.org/10.1134/S2075113321040079 Статья на русском языке
Natura:	Elettronico Capitolo di libro
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=665175

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