In-situ impedance spectroscopy of a plasma-semiconductor thin film system during reactive sputter deposition; Journal of Applied Physics; Vol. 126

In-situ impedance spectroscopy of a plasma-semiconductor thin film system during reactive sputter deposition; Journal of Applied Physics; Vol. 126

Détails bibliographiques
Parent link:Journal of Applied Physics
Vol. 126.— 2020.— [023301, 12 p.]
Autres auteurs: Zanaska M., Kudrna P., Cada M., Tichy M. Milan, Hubicka Z.
Résumé:Title screen
We present a comparatively simple-to-apply in situ diagnostic suitable for determining the dielectric properties of nonconducting and semiconducting thin films during plasma-aided deposition. The method is based on measurement of the impedance spectrum of a system plasma-film within the kilohertz range of frequencies, i.e., without the need of special equipment. Total film capacitance, resistance, and the loss factor tan d can be estimated in situ from the measured impedance spectra. Provided that the film thickness is known, the dielectric and electrical properties of the deposited films, such as relative permittivity ?r and conductivity s, can be estimated as well. The applicability of the developed method is demonstrated on Fe2O3 and TiO2 thin films during deposition in a low-pressure low-temperature plasma-jet system and on a TiO2 thin film during deposition in a planar magnetron system. The experimentally obtained dielectric properties are compared with data from the literature.
Langue:anglais
Publié: 2020
Sujets:
электронный ресурс
труды учёных ТПУ
Accès en ligne:https://doi.org/10.1063/1.5102163
Format: Électronique Chapitre de livre
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=664999

Documents similaires

Documents similaires