Zanaska M, Kudrna P, Cada M, Tichy M. Milan, & Hubicka Z. (2020). In-situ impedance spectroscopy of a plasma-semiconductor thin film system during reactive sputter deposition; Journal of Applied Physics; Vol. 126. 2020. https://doi.org/10.1063/1.5102163
Chicago-viite (17. p.)Zanaska M, Kudrna P, Cada M, Tichy M. Milan, ja Hubicka Z. In-situ Impedance Spectroscopy of a Plasma-semiconductor Thin Film System During Reactive Sputter Deposition; Journal of Applied Physics; Vol. 126. 2020, 2020. https://doi.org/10.1063/1.5102163.
MLA-viite (9. p.)Zanaska M, et al. In-situ Impedance Spectroscopy of a Plasma-semiconductor Thin Film System During Reactive Sputter Deposition; Journal of Applied Physics; Vol. 126. 2020, 2020. https://doi.org/10.1063/1.5102163.