Plasma Diagnostics in Reactive High-Power Impulse Magnetron Sputtering System Working in Ar + H2S Gas Mixture; Coatings; Vol. 10, iss. 3

Plasma Diagnostics in Reactive High-Power Impulse Magnetron Sputtering System Working in Ar + H2S Gas Mixture; Coatings; Vol. 10, iss. 3

書目詳細資料
Parent link:Coatings
Vol. 10, iss. 3.— 2020.— [246, 16 p.]
其他作者: Hubicka Z., Cada M. Martin, Kapran A. Anna, Olejnícek J. Jiri, Ksírová P., Zanaska M., Adamek P., Tichy M. Milan
總結:Title screen
A reactive high-power impulse magnetron sputtering system (HiPIMS) working in Ar + H2S gas mixture was investigated as a source for the deposition of iron sulfide thin films. As a sputtering material, a pure Fe target was used. Plasma parameters in this system were investigated by a time-resolved Langmuir probe, radio-frequency (RF) ion flux probe, quartz crystal monitor modified for measurement of the ionized fraction of depositing particles, and by optical emission spectroscopy. A wide range of mass flow rates of reactive gas H2S was used for the investigation of the deposition process. It was found that the deposition rate of iron sulfide thin films is not influenced by the flow rate of H2S reactive gas fed into the magnetron discharge although the target is covered by iron sulfide compound. The ionized fraction of depositing particles decreases from r ˜ 40% to r ˜ 20% as the flow rate of H2S, QH2S, changes from 0 to 19 sccm at the gas pressure around p ˜ 1 Pa in the reactor chamber. The electron concentration ne measured by the Langmuir probe at the position of the substrate decreases over this change of QH2S from 1018 down to 1017 m-3
語言:英语
出版: 2020
主題:
электронный ресурс
труды учёных ТПУ
HiPIMS
Langmuir probe
optical emission spectrometry
time-resolved probe measurements
H2S
electron density
electron temperature
ionization fraction
SEM
XRD
在線閱讀:https://doi.org/10.3390/coatings10030246
格式: 電子 Book Chapter
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=664997

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