Hubicka Z, Cada M. Martin, Kapran A. Anna, Olejnícek J. Jiri, Ksírová P, Zanaska M, . . . Tichy M. Milan. (2020). Plasma Diagnostics in Reactive High-Power Impulse Magnetron Sputtering System Working in Ar + H2S Gas Mixture; Coatings; Vol. 10, iss. 3. 2020. https://doi.org/10.3390/coatings10030246
Chicago Style (17th ed.) CitationHubicka Z, Cada M. Martin, Kapran A. Anna, Olejnícek J. Jiri, Ksírová P, Zanaska M, Adamek P, and Tichy M. Milan. Plasma Diagnostics in Reactive High-Power Impulse Magnetron Sputtering System Working in Ar + H2S Gas Mixture; Coatings; Vol. 10, Iss. 3. 2020, 2020. https://doi.org/10.3390/coatings10030246.
MLA (9th ed.) CitationHubicka Z, et al. Plasma Diagnostics in Reactive High-Power Impulse Magnetron Sputtering System Working in Ar + H2S Gas Mixture; Coatings; Vol. 10, Iss. 3. 2020, 2020. https://doi.org/10.3390/coatings10030246.