Plasma diagnostics and characterization of the Mg and Mg–Zn thin films deposited by thermionic vacuum arc (TVA) method; Vacuum; Vol. 167

Бібліографічні деталі
Parent link:Vacuum
Vol. 167.— 2019.— [P. 129-135]
Інші автори: Vladoiu R., Mandes A., Dinca V., Prodan G., Kudrna P., Tichy M. Milan
Резюме:Title screen
The Thermionic Vacuum Arc (TVA) is an original deposition method using a combination of anodic arc and powerful electron gun system (up to 600 W) for the growth of thin films from solid precursors under a vacuum of 10?4 Pa. The advantage of this technology is the comparatively high deposition rate while keeping good properties of the deposited films. The aim of this paper is to report on the characterization of the Mg and Mg–Zn thin films deposited by the TVA method. By careful selection of the deposition parameters, we have achieved a rather stable discharge that resulted in good film properties. The surface morphology and wettability of the deposited Mg and Mg–Zn thin films were investigated using transmission electron microscopy (TEM), scanning electron microscopy (SEM) and free surface energy (FSE) by surface energy evaluation system. The results revealed that the size of crystallites is 5.0 nm in the case of Mg–Zn/Si and 6.5 nm in the case of Mg/Si sample; a promising result for future applications of the TVA. The film properties are complemented by plasma parameters measured by a heated probe.
Режим доступа: по договору с организацией-держателем ресурса
Мова:Англійська
Опубліковано: 2019
Предмети:
Онлайн доступ:https://doi.org/10.1016/j.vacuum.2019.06.002
Формат: MixedMaterials Електронний ресурс Частина з книги
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=664996

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200 1 |a Plasma diagnostics and characterization of the Mg and Mg–Zn thin films deposited by thermionic vacuum arc (TVA) method  |f R. Vladoiu, A. Mandes, V. Dinca [et al.] 
203 |a Text  |c electronic 
300 |a Title screen 
320 |a [References: 35 tit.] 
330 |a The Thermionic Vacuum Arc (TVA) is an original deposition method using a combination of anodic arc and powerful electron gun system (up to 600 W) for the growth of thin films from solid precursors under a vacuum of 10?4 Pa. The advantage of this technology is the comparatively high deposition rate while keeping good properties of the deposited films. The aim of this paper is to report on the characterization of the Mg and Mg–Zn thin films deposited by the TVA method. By careful selection of the deposition parameters, we have achieved a rather stable discharge that resulted in good film properties. The surface morphology and wettability of the deposited Mg and Mg–Zn thin films were investigated using transmission electron microscopy (TEM), scanning electron microscopy (SEM) and free surface energy (FSE) by surface energy evaluation system. The results revealed that the size of crystallites is 5.0 nm in the case of Mg–Zn/Si and 6.5 nm in the case of Mg/Si sample; a promising result for future applications of the TVA. The film properties are complemented by plasma parameters measured by a heated probe. 
333 |a Режим доступа: по договору с организацией-держателем ресурса 
461 |t Vacuum 
463 |t Vol. 167  |v [P. 129-135]  |d 2019 
610 1 |a электронный ресурс 
610 1 |a труды учёных ТПУ 
610 1 |a Mg-Zn thin films 
610 1 |a plasma diagnostics 
610 1 |a thermionic vacuum arc 
610 1 |a scanning electron microscopy (SEM) 
610 1 |a surface energy 
610 1 |a transmission electron microscopy (TEM) 
610 1 |a тонкие пленки 
610 1 |a диагностика 
610 1 |a сканирующая электронная микроскопия 
610 1 |a поверхностная энергия 
610 1 |a просвечивающая электронная микроскопия 
701 1 |a Vladoiu  |b R. 
701 1 |a Mandes  |b A. 
701 1 |a Dinca  |b V. 
701 1 |a Prodan  |b G. 
701 1 |a Kudrna  |b P. 
701 1 |a Tichy  |b M.  |c chemist  |c Professor of Tomsk Polytechnic University, Doctor of physical and mathematical sciences  |f 1947-  |g Milan  |3 (RuTPU)RU\TPU\pers\35771 
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856 4 |u https://doi.org/10.1016/j.vacuum.2019.06.002 
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