Low energy, high intensity metal ion implantation method for deep dopant containing layer formation

Low energy, high intensity metal ion implantation method for deep dopant containing layer formation

Detalles Bibliográficos
Parent link:Surface and Coatings Technology
Vol. 355.— 2018.— [P. 123-128]
Autor Corporativo: Национальный исследовательский Томский политехнический университет Инженерная школа ядерных технологий Научная лаборатория высокоинтенсивной имплантации ионов
Otros Autores: Ryabchikov A. I. Aleksandr Ilyich, Shevelev A. E. Aleksey Eduardovich, Sivin D. O. Denis Olegovich, Ivanova A. I. Anna Ivanovna, Medvedev V. N. Vladislav Nikolaevich
Sumario:Title screen
This study describes the first results of high intensity macroparticle-free aluminum ion beam formation and its application to low ion energy implantation. A DC vacuum arc was used to produce aluminum plasma flow. A repetitively pulsed macroparticle-free high intensity aluminum ion beam was formed using a plasma immersion ion extraction combined with ion beam focusing. A very high current ion beam with the current up to 0.475 A at bias pulse duration of 4 [mu]s and the pulse repetition rate of 105 pulses per second was obtained. Nickel substrates were irradiated by aluminum ions with very high current densities up to 100 mA/cm2 and accelerating voltages up to 2.1 kV. The maximum fluence of implantation reached 1.2•1021 ion/сm2. The results of the element composition of the modified layer were also investigated
Режим доступа: по договору с организацией-держателем ресурса
Lenguaje:inglés
Publicado: 2018
Materias:
электронный ресурс
труды учёных ТПУ
high intensity ion beam
metal ion implantation
intermetallic layers
aluminum
nickel
ионные пучки
имплантация
ионы металлов
алюминий
никель
слои
Acceso en línea:https://doi.org/10.1016/j.surfcoat.2018.02.111
Formato: Electrónico Capítulo de libro
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=664533

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