Low energy, high intensity metal ion implantation method for deep dopant containing layer formation; Surface and Coatings Technology; Vol. 355
| Parent link: | Surface and Coatings Technology Vol. 355.— 2018.— [P. 123-128] |
|---|---|
| Collectivité auteur: | |
| Autres auteurs: | , , , , |
| Résumé: | Title screen This study describes the first results of high intensity macroparticle-free aluminum ion beam formation and its application to low ion energy implantation. A DC vacuum arc was used to produce aluminum plasma flow. A repetitively pulsed macroparticle-free high intensity aluminum ion beam was formed using a plasma immersion ion extraction combined with ion beam focusing. A very high current ion beam with the current up to 0.475 A at bias pulse duration of 4 [mu]s and the pulse repetition rate of 105 pulses per second was obtained. Nickel substrates were irradiated by aluminum ions with very high current densities up to 100 mA/cm2 and accelerating voltages up to 2.1 kV. The maximum fluence of implantation reached 1.2•1021 ion/сm2. The results of the element composition of the modified layer were also investigated Режим доступа: по договору с организацией-держателем ресурса |
| Langue: | anglais |
| Publié: |
2018
|
| Sujets: | |
| Accès en ligne: | https://doi.org/10.1016/j.surfcoat.2018.02.111 |
| Format: | Électronique Chapitre de livre |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=664533 |