Effect of high intensity short-pulsed ion irradiation on optical properties of multilayer coatings of aluminum and silicon nitrides

Bibliographic Details
Parent link:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
Vol. 494-495.— 2021.— [Р. 1-9]
Corporate Authors: Национальный исследовательский Томский политехнический университет Исследовательская школа физики высокоэнергетических процессов, Национальный исследовательский Томский политехнический университет Инженерная школа новых производственных технологий Научно-производственная лаборатория "Импульсно-пучковых, электроразрядных и плазменных технологий"
Other Authors: Konusov F. V. Fedor Valerievich, Pavlov S. K. Sergey Konstantinovich, Lauk A. L. Aleksandr Lukyanovich, Tarbokov V. A. Vladislav Aleksandrovich, Gadirov R. M. Ruslan Mukhamedzhanovich, Remnev G. E. Gennady Efimovich
Summary:Title screen
The effect of high-intensity short-pulsed ion irradiation on the optical properties of multilayer coatings, consisting from thin layers of aluminum and silicon nitrides, deposited by reactive magnetron sputtering on glass, steel and silicon substrates, has been investigated. The larger the thickness of AlN layers, the stronger the effect of growth and radiation defects on multilayer coating properties. When the concentration of growth defects increases and its interaction intensifies, the radiation resistance of coatings grows. In general, the radiation resistance of coatings was due to the wide band gap of their constituent nitrides and the high concentration of strongly interacting growth defects distributed along the inter-crystallite and interlayer boundaries.
Режим доступа: по договору с организацией-держателем ресурса
Published: 2021
Subjects:
Online Access:https://doi.org/10.1016/j.nimb.2021.02.007
Format: Electronic Book Chapter
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=664206