Knyazeva A. G. Anna Georgievna, Kryukova O. N. Olga Nikolaevna, & Maslov A. L. Aleksey Leonidovich. (2019). Modelling of transition zone formation between thin Si or Ta film deposited on TiNi under low-energy electron beam irradiation; Materials Research Express; Vol. 6, iss. 10. 2019. https://doi.org/10.1088/2053-1591/ab41a5
Cytowanie według stylu Chicago (wyd. 17)Knyazeva A. G. Anna Georgievna, Kryukova O. N. Olga Nikolaevna, i Maslov A. L. Aleksey Leonidovich. Modelling of Transition Zone Formation Between Thin Si or Ta Film Deposited on TiNi Under Low-energy Electron Beam Irradiation; Materials Research Express; Vol. 6, Iss. 10. 2019, 2019. https://doi.org/10.1088/2053-1591/ab41a5.
Cytowanie według stylu MLA (wyd. 9)Knyazeva A. G. Anna Georgievna, et al. Modelling of Transition Zone Formation Between Thin Si or Ta Film Deposited on TiNi Under Low-energy Electron Beam Irradiation; Materials Research Express; Vol. 6, Iss. 10. 2019, 2019. https://doi.org/10.1088/2053-1591/ab41a5.