Measurement and Calculation of the Absorbed Dose During Irradiation of the Grain by a Pulse Electron Beam with Energy up to 160 keV; Energy Fluxes and Radiation Effects (EFRE-2020 online)

Dades bibliogràfiques
Parent link:Energy Fluxes and Radiation Effects (EFRE-2020 online).— 2020.— [P. 310-314]
Altres autors: Vorobjev (Vorobyov) M. S. Maksim Sergeevich, Doroshkevich S. Sergey, Pokrovskaya E. A. Elena Aleksandrovna, Artemov (Artyomov) K. P. Konstantin Petrovich
Sumari:Title screen
The paper presents the results of measuring the absorbed dose, performed using dosimetric films on a wide-aperture pulse-periodic electron accelerator “DUET” with a grid plasma cathode based on a low-pressure arc discharge and the output of the generated beam into the ambient atmosphere. The possibility of using this accelerator to irradiate wheat, barley, oats, peas, and corn has been previously shown. In this work, we performed numerical calculations of the distribution of the absorbed dose over the grain depth. Calculations show that the absorbed dose depends on the initial energy of the electron beam (in the range 100-160 keV) and is distributed substantially non-uniformly. The main absorbed dose is concentrated in the outer layer (seed coat of grain), while the absorbed dose in the inner part of the grain was four orders of magnitude lower. The results of numerical calculations are consistent with experimental measurements.
AM_Agreement
Idioma:anglès
Publicat: 2020
Matèries:
Accés en línia:https://doi.org/10.1109/EFRE47760.2020.9242035
Format: MixedMaterials Electrònic Capítol de llibre
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=663034

MARC

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200 1 |a Measurement and Calculation of the Absorbed Dose During Irradiation of the Grain by a Pulse Electron Beam with Energy up to 160 keV  |f M. Vorobyov, S. Doroshkevich, E. A. Pokrovskaya, K. Artyomov 
203 |a Текст  |c электронный  |b визуальный 
300 |a Title screen 
320 |a [References: p. 313-314 (4 tit.)] 
330 |a The paper presents the results of measuring the absorbed dose, performed using dosimetric films on a wide-aperture pulse-periodic electron accelerator “DUET” with a grid plasma cathode based on a low-pressure arc discharge and the output of the generated beam into the ambient atmosphere. The possibility of using this accelerator to irradiate wheat, barley, oats, peas, and corn has been previously shown. In this work, we performed numerical calculations of the distribution of the absorbed dose over the grain depth. Calculations show that the absorbed dose depends on the initial energy of the electron beam (in the range 100-160 keV) and is distributed substantially non-uniformly. The main absorbed dose is concentrated in the outer layer (seed coat of grain), while the absorbed dose in the inner part of the grain was four orders of magnitude lower. The results of numerical calculations are consistent with experimental measurements. 
371 0 |a AM_Agreement 
463 1 |0 (RuTPU)RU\TPU\network\34152  |t Energy Fluxes and Radiation Effects (EFRE-2020 online)  |o proceedings of 7th International Congress, September 14-26, 2020, Tomsk, Russia  |f National Research Tomsk Polytechnic University (TPU) ; Institute of Electrical and Electronics Engineers (IEEE) ; ed. N. A. Ratakhin  |v [P. 310-314]  |d 2020 
610 1 |a электронный ресурс 
610 1 |a труды учёных ТПУ 
610 1 |a electron accelerator 
610 1 |a absorbed dose 
610 1 |a dosimetric films 
610 1 |a grain 
610 1 |a ускорители электронов 
610 1 |a поглощенные дозы 
610 1 |a пленки 
610 1 |a облучение 
610 1 |a зерна 
610 1 |a импульсные пучки 
701 1 |a Vorobjev (Vorobyov)  |b M. S.  |c specialist in the field of electronics  |c Professor of Tomsk Polytechnic University, Doctor of Technical Sciences  |f 1986-  |g Maksim Sergeevich  |9 89110 
701 1 |a Doroshkevich  |b S.  |g Sergey 
701 1 |a Pokrovskaya  |b E. A.  |c physicist  |c Techniques-dosimetrist of Tomsk Polytechnic University  |f 1989-  |g Elena Aleksandrovna  |3 (RuTPU)RU\TPU\pers\32629  |9 16541 
701 1 |a Artemov (Artyomov)  |b K. P.  |c specialist in the field of electronics  |c engineer of Tomsk Polytechnic University  |f 1979-  |g Konstantin Petrovich  |9 18703 
801 2 |a RU  |b 63413507  |c 20210203  |g RCR 
856 4 |u https://doi.org/10.1109/EFRE47760.2020.9242035  |z https://doi.org/10.1109/EFRE47760.2020.9242035 
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