Microstructure of titanium alloy modified by high-intensity implantation of low- and high-energy aluminium ions
| Parent link: | Surface and Coatings Technology Vol. 391.— 2020.— [125722, 6 p.] |
|---|---|
| Corporate Authors: | , , |
| Other Authors: | , , , , |
| Summary: | Title screen This study focuses on the analysis of microstructural, elemental and phase compositions of surface and near-surface layers of titanium after the implantation of aluminium. A titanium alloy with a chemical composition close to commercially pure titanium (grade 2) was used as the target material. Ion implantation was performed using two modes of irradiation: 1. repetitively pulsed ion beams with a mean ion energy of 35 keV; 2. low-energy-focused ion beams of high intensity with a mean ion energy of 2.6 keV. The irradiation fluence reached 1.1 Ч 1018 ion/cm2 using the first mode and 1.6 Ч 1021 ion/cm2 using the second mode. In both cases, the beam itself heated the targets. The peak concentration of aluminium after the implantation of medium-energy ions was ~65 at.%, and the maximum depth of dopant penetration was 2.6 µm. On the contrary, in the case of high-intensity low-energy ion implantation, the surface concentration of dopant reached a maximum of 25 at.%, but the depth of penetration increased significantly and achieved 50 µm. The results of X-ray diffraction (XRD) and transmission electron microscopy (TEM) showed that fine-grained intermetallic phases, Ti3Al and TiAl, and solid solutions of various compositions were possibly formed after the medium-energy ion implantation. The mean grain size of the intermetallic phases was ~50 nm. XRD and TEM analyses in the case of low-energy high-intensity ion implantation demonstrated the formation of the ion-alloyed layer, which comprised intermetallic phase Ti3Al and solid solutions of aluminium in titanium. The grain size of Ti3Al phase can be 5 µm and more. Режим доступа: по договору с организацией-держателем ресурса |
| Language: | English |
| Published: |
2020
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| Subjects: | |
| Online Access: | https://doi.org/10.1016/j.surfcoat.2020.125722 |
| Format: | Electronic Book Chapter |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=662969 |
MARC
| LEADER | 00000naa0a2200000 4500 | ||
|---|---|---|---|
| 001 | 662969 | ||
| 005 | 20250418164539.0 | ||
| 035 | |a (RuTPU)RU\TPU\network\34137 | ||
| 090 | |a 662969 | ||
| 100 | |a 20210118d2020 k||y0rusy50 ba | ||
| 101 | 0 | |a eng | |
| 135 | |a drcn ---uucaa | ||
| 181 | 0 | |a i | |
| 182 | 0 | |a b | |
| 200 | 1 | |a Microstructure of titanium alloy modified by high-intensity implantation of low- and high-energy aluminium ions |f A. I. Ryabchikov, D. O. Sivin, I. A. Bozhko [et al.] | |
| 203 | |a Text |c electronic | ||
| 300 | |a Title screen | ||
| 320 | |a [References: 31 tit.] | ||
| 330 | |a This study focuses on the analysis of microstructural, elemental and phase compositions of surface and near-surface layers of titanium after the implantation of aluminium. A titanium alloy with a chemical composition close to commercially pure titanium (grade 2) was used as the target material. Ion implantation was performed using two modes of irradiation: 1. repetitively pulsed ion beams with a mean ion energy of 35 keV; 2. low-energy-focused ion beams of high intensity with a mean ion energy of 2.6 keV. The irradiation fluence reached 1.1 Ч 1018 ion/cm2 using the first mode and 1.6 Ч 1021 ion/cm2 using the second mode. In both cases, the beam itself heated the targets. The peak concentration of aluminium after the implantation of medium-energy ions was ~65 at.%, and the maximum depth of dopant penetration was 2.6 µm. On the contrary, in the case of high-intensity low-energy ion implantation, the surface concentration of dopant reached a maximum of 25 at.%, but the depth of penetration increased significantly and achieved 50 µm. The results of X-ray diffraction (XRD) and transmission electron microscopy (TEM) showed that fine-grained intermetallic phases, Ti3Al and TiAl, and solid solutions of various compositions were possibly formed after the medium-energy ion implantation. The mean grain size of the intermetallic phases was ~50 nm. XRD and TEM analyses in the case of low-energy high-intensity ion implantation demonstrated the formation of the ion-alloyed layer, which comprised intermetallic phase Ti3Al and solid solutions of aluminium in titanium. The grain size of Ti3Al phase can be 5 µm and more. | ||
| 333 | |a Режим доступа: по договору с организацией-держателем ресурса | ||
| 461 | |t Surface and Coatings Technology | ||
| 463 | |t Vol. 391 |v [125722, 6 p.] |d 2020 | ||
| 610 | 1 | |a электронный ресурс | |
| 610 | 1 | |a труды учёных ТПУ | |
| 610 | 1 | |a high-intensity ion implantation | |
| 610 | 1 | |a aluminium | |
| 610 | 1 | |a titanium alloy | |
| 610 | 1 | |a intermetallic phase | |
| 610 | 1 | |a solid solution | |
| 610 | 1 | |a ионная имплантация | |
| 610 | 1 | |a алюминий | |
| 610 | 1 | |a титановые сплавы | |
| 610 | 1 | |a твердые растворы | |
| 701 | 1 | |a Ryabchikov |b A. I. |c Professor of Tomsk Polytechnic University, Doctor of physical and mathematical sciences |c physicist |f 1950- |g Aleksandr Ilyich |3 (RuTPU)RU\TPU\pers\30912 |9 15150 | |
| 701 | 1 | |a Sivin |b D. O. |c physicist |c Senior researcher of Tomsk Polytechnic University, Candidate of technical sciences |f 1978- |g Denis Olegovich |3 (RuTPU)RU\TPU\pers\34240 |9 17771 | |
| 701 | 1 | |a Bozhko |b I. A. |c physicist |c Associate Professor of Tomsk Polytechnic University, Candidate of physical and mathematical sciences |f 1980- |g Irina Aleksandrovna |3 (RuTPU)RU\TPU\pers\34206 |9 17740 | |
| 701 | 1 | |a Stepanov |b I. B. |c physicist |c Head of the laboratory of Tomsk Polytechnic University, Doctor of technical sciences |f 1968- |g Igor Borisovich |3 (RuTPU)RU\TPU\pers\34218 | |
| 701 | 1 | |a Shevelev |b A. E. |c Physicist |c Engineer of Tomsk Polytechnic University |f 1990- |g Aleksey Eduardovich |3 (RuTPU)RU\TPU\pers\36832 | |
| 712 | 0 | 2 | |a Национальный исследовательский Томский политехнический университет |b Инженерная школа ядерных технологий |b Научная лаборатория высокоинтенсивной имплантации ионов |3 (RuTPU)RU\TPU\col\23698 |
| 712 | 0 | 2 | |a Национальный исследовательский Томский политехнический университет |b Инженерная школа новых производственных технологий |b Отделение материаловедения |3 (RuTPU)RU\TPU\col\23508 |
| 712 | 0 | 2 | |a Национальный исследовательский Томский политехнический университет |b Исследовательская школа физики высокоэнергетических процессов |c (2017- ) |3 (RuTPU)RU\TPU\col\23551 |
| 801 | 2 | |a RU |b 63413507 |c 20210118 |g RCR | |
| 850 | |a 63413507 | ||
| 856 | 4 | |u https://doi.org/10.1016/j.surfcoat.2020.125722 | |
| 942 | |c CF | ||