Preparation of ultrafine Cu3Si in high-current pulsed arc discharge; Nanotechnologies in Russia; Vol. 11, iss. 9

Détails bibliographiques
Parent link:Nanotechnologies in Russia.— , 2006-
Vol. 11, iss. 9.— 2016.— [P. 548-552]
Collectivité auteur: Национальный исследовательский Томский политехнический университет Энергетический институт Кафедра электроснабжения промышленных предприятий
Autres auteurs: Pak A. Ya. Aleksandr Yakovlevich, Shatrova K. N. Kseniya Nikolaevna, Aktaev N. E. Nurken Erbolatovich, Ivashutenko A. S. Alexander Sergeevich
Résumé:Title screen
The results of experimental research into ultrafine copper silicide production in plasma high-current pulsed arc discharge are shown. According to X-ray diffraction, the product consists primarily of ??-Cu3Si (81%) and contains copper and silicon. A study of the material by transmission electron microscopy reveals the formation of elongated pointed copper silicide crystals with cross-sectional dimensions of approximately 250 nm. The presented method of preparation of copper silicide allow one to obtain grams of the ultrafine product per one operating cycle of the system, the duration of which is about 0.5 ms. The materials prepared may be used in the power industry, for example, for the manufacture of electrode systems of power supplies.
Режим доступа: по договору с организацией-держателем ресурса
Langue:anglais
Publié: 2016
Sujets:
Accès en ligne:http://dx.doi.org/10.1134/S199507801605013X
Format: Électronique Chapitre de livre
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=662720
Description
Résumé:Title screen
The results of experimental research into ultrafine copper silicide production in plasma high-current pulsed arc discharge are shown. According to X-ray diffraction, the product consists primarily of ??-Cu3Si (81%) and contains copper and silicon. A study of the material by transmission electron microscopy reveals the formation of elongated pointed copper silicide crystals with cross-sectional dimensions of approximately 250 nm. The presented method of preparation of copper silicide allow one to obtain grams of the ultrafine product per one operating cycle of the system, the duration of which is about 0.5 ms. The materials prepared may be used in the power industry, for example, for the manufacture of electrode systems of power supplies.
Режим доступа: по договору с организацией-держателем ресурса
DOI:10.1134/S199507801605013X