Study and production of thin-film memristors based on TiO2 – TiOx layers; IOP Conference Series: Materials Science and Engineering; Vol. 498 : Advanced Micro- and Nanoelectronic Systems and Technologies

Chi tiết về thư mục
Parent link:IOP Conference Series: Materials Science and Engineering
Vol. 498 : Advanced Micro- and Nanoelectronic Systems and Technologies.— 2019.— [012022, 4 p.]
Tác giả của công ty: Национальный исследовательский Томский политехнический университет Инженерная школа ядерных технологий Научно-образовательный центр Б. П. Вейнберга
Tác giả khác: Zhidik E. V. Ekaterina Vyacheslavovna, Troyan P. E. Pavel Efimovich, Sakharov Yu. V. Yury Vladimirovich, Zhidik Yu. S. Yury Sergeevich, Korzhenko D. V. Dmitry Vladimirovich
Tóm tắt:Title screen
Results of production of thin-film memristor MIM-structures based on the stoichiometric (TiO2) and nonstoichiometric (TiOx) titanium oxides and contacts without precious and rare-earth metals are given. It is shown that such memristor structures without precious metals show its operability only after the process of electrical forming.
Ngôn ngữ:Tiếng Anh
Được phát hành: 2019
Những chủ đề:
Truy cập trực tuyến:https://doi.org/10.1088/1757-899X/498/1/012022
Định dạng: Điện tử Chương của sách
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=662537
Miêu tả
Tóm tắt:Title screen
Results of production of thin-film memristor MIM-structures based on the stoichiometric (TiO2) and nonstoichiometric (TiOx) titanium oxides and contacts without precious and rare-earth metals are given. It is shown that such memristor structures without precious metals show its operability only after the process of electrical forming.
DOI:10.1088/1757-899X/498/1/012022