Properties of ZnO:Al, ZnO:Al–SiO2 Films Obtained in Sol Gel Process from Coating Solutions; Russian Physics Journal; Vol. 63, iss. 4
| Parent link: | Russian Physics Journal Vol. 63, iss. 4.— 2020.— [P. 591-598] |
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| Autor Principal: | |
| Autor Corporativo: | |
| Outros autores: | , |
| Summary: | Title screen The paper deals with ZnO, ZnO:Al 5 wt.% and ZnO:Al 5 wt.% – SiO2 5 wt.% thin films obtained on glass substrates by the sol gel process from film-forming solutions Zn[C6H4OHCOO]NO3, Al(NO3)3·9H2O and Si(OC2H5)4. The film properties such as transmission in the visible region, surface resistance and photocatalysis are investigated. It is shown that the aluminum addition has no effect on the ZnO film transmission in the visible region, but improves the film conductivity through the decrease in the surface resistance down to 107 Ohm. The ZnO:Al – SiO2 film has the highest transmission of 95%. The addition of SiO2 has no effect on the ZnO:Al film transmission. The maximum photocatalytic activity is observed in the ZnO:Al film. The photodecomposition velocity of methyl orange is 1.47 •10–2 min–1, that is by one order higher as compared to that in the presence of Degussa P25 adsorptive photocatalyst. The SiO2 addition lowers the degree of crystallinity of the ZnO:Al film and its photocatalytic activity. Режим доступа: по договору с организацией-держателем ресурса |
| Idioma: | inglés |
| Publicado: |
2020
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| Subjects: | |
| Acceso en liña: | https://doi.org/10.1007/s11182-020-02072-w |
| Formato: | Electrónico Capítulo de libro |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=662516 |
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| 200 | 1 | |a Properties of ZnO:Al, ZnO:Al–SiO2 Films Obtained in Sol Gel Process from Coating Solutions |d Свойства пленок ZnO:Al, ZnO:Al-Sio2, полученных золь-гель-методом из пленкообразующих растворов |f S. A. Kuznetsova, A. G. Malchik, V. V. Kozik | |
| 203 | |a Text |c electronic | ||
| 300 | |a Title screen | ||
| 320 | |a [References: 26 tit.] | ||
| 330 | |a The paper deals with ZnO, ZnO:Al 5 wt.% and ZnO:Al 5 wt.% – SiO2 5 wt.% thin films obtained on glass substrates by the sol gel process from film-forming solutions Zn[C6H4OHCOO]NO3, Al(NO3)3·9H2O and Si(OC2H5)4. The film properties such as transmission in the visible region, surface resistance and photocatalysis are investigated. It is shown that the aluminum addition has no effect on the ZnO film transmission in the visible region, but improves the film conductivity through the decrease in the surface resistance down to 107 Ohm. The ZnO:Al – SiO2 film has the highest transmission of 95%. The addition of SiO2 has no effect on the ZnO:Al film transmission. The maximum photocatalytic activity is observed in the ZnO:Al film. The photodecomposition velocity of methyl orange is 1.47 •10–2 min–1, that is by one order higher as compared to that in the presence of Degussa P25 adsorptive photocatalyst. The SiO2 addition lowers the degree of crystallinity of the ZnO:Al film and its photocatalytic activity. | ||
| 333 | |a Режим доступа: по договору с организацией-держателем ресурса | ||
| 461 | |t Russian Physics Journal | ||
| 463 | |t Vol. 63, iss. 4 |v [P. 591-598] |d 2020 | ||
| 510 | 1 | |a Свойства пленок ZnO:Al, ZnO:Al-Sio2, полученных золь-гель-методом из пленкообразующих растворов |z rus | |
| 610 | 1 | |a электронный ресурс | |
| 610 | 1 | |a труды учёных ТПУ | |
| 610 | 1 | |a ZnO:Al | |
| 610 | 1 | |a ZnO:Al-SiO2 films | |
| 610 | 1 | |a surface resistance | |
| 610 | 1 | |a photocatalysis of organic dyes | |
| 610 | 1 | |a transparent film | |
| 610 | 1 | |a surface morphology | |
| 700 | 1 | |a Kuznetsova |b S. A. |g Svetlana Anatoljevna | |
| 701 | 1 | |a Malchik |b A. G. |c specialist in the field of ecology and life safety |c Associate Professor of Yurga technological Institute of Tomsk Polytechnic University, candidate of technical sciences |f 1970- |g Aleksandra Gennadievna |3 (RuTPU)RU\TPU\pers\34721 |9 18071 | |
| 701 | 1 | |a Kozik |b V. V. |c Chemical Engineer |c Professor-consultant of Yurga technological Institute of Tomsk Polytechnic University |f 1947- |g Vladimir Vasilievich |3 (RuTPU)RU\TPU\pers\34722 |9 18072 | |
| 712 | 0 | 2 | |a Национальный исследовательский Томский политехнический университет |b Юргинский технологический институт |c (2009- ) |3 (RuTPU)RU\TPU\col\15903 |9 26306 |
| 801 | 2 | |a RU |b 63413507 |c 20200827 |g RCR | |
| 856 | 4 | 0 | |u https://doi.org/10.1007/s11182-020-02072-w |
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