Laser-Associated Selective Metallization of Ceramic Surface with Infrared Nanosecond Laser Technology; Advanced Engineering Materials; Vol. 21, iss. 7

Bibliografiska uppgifter
Parent link:Advanced Engineering Materials
Vol. 21, iss. 7.— 2019.— [1900096, 6 p.]
Institutionell upphovsman: Национальный исследовательский Томский политехнический университет Инженерная школа новых производственных технологий Отделение материаловедения
Övriga upphovsmän: Wang Li, Fu Z. Zongwen, Suess-Wolf R. Robert, Greil P. Peter, Travitsky (Travitzky) N. Nakhum, Franke J. Joerg
Sammanfattning:Title screen
A new approach for the metallization of ceramic substrate by Infrared Nanosecond Laser Technology (INLT) is developed in the present work. The activation of ceramic surface by INLT with a wavelength of 1064 nm promotes the chemical electroless copper plating. The laser associated modification of ceramics in terms of laser ablation is also determined. The ablation threshold for the Al2O3-Cu2O ceramic used in this study is identified at 3.82 and 1.86 J cm−2 with respect to single pulse irradiation and multiple pulses irradiation, respectively. The thickness of plated copper layer on the activated ceramic surface is strongly dependent on the laser fluence and can reach the maximum thickness at the fluence nearby the ablation threshold.
Språk:engelska
Publicerad: 2019
Ämnen:
Länkar:https://doi.org/10.1002/adem.201900096
Materialtyp: MixedMaterials Elektronisk Bokavsnitt
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=662328

MARC

LEADER 00000naa0a2200000 4500
001 662328
005 20250407153250.0
035 |a (RuTPU)RU\TPU\network\33465 
035 |a RU\TPU\network\33464 
090 |a 662328 
100 |a 20200716d2019 k||y0rusy50 ba 
101 0 |a eng 
102 |a US 
135 |a drcn ---uucaa 
181 0 |a i  
182 0 |a b 
200 1 |a Laser-Associated Selective Metallization of Ceramic Surface with Infrared Nanosecond Laser Technology  |f Wang Li, Z. Fu, R. Suess-Wolf [et al.] 
203 |a Text  |c electronic 
300 |a Title screen 
320 |a [References: 14 tit.] 
330 |a A new approach for the metallization of ceramic substrate by Infrared Nanosecond Laser Technology (INLT) is developed in the present work. The activation of ceramic surface by INLT with a wavelength of 1064 nm promotes the chemical electroless copper plating. The laser associated modification of ceramics in terms of laser ablation is also determined. The ablation threshold for the Al2O3-Cu2O ceramic used in this study is identified at 3.82 and 1.86 J cm−2 with respect to single pulse irradiation and multiple pulses irradiation, respectively. The thickness of plated copper layer on the activated ceramic surface is strongly dependent on the laser fluence and can reach the maximum thickness at the fluence nearby the ablation threshold. 
461 |t Advanced Engineering Materials 
463 |t Vol. 21, iss. 7  |v [1900096, 6 p.]  |d 2019 
610 1 |a электронный ресурс 
610 1 |a труды учёных ТПУ 
610 1 |a ablation threshold 
610 1 |a laser ablation 
610 1 |a metallization of ceramic 
610 1 |a nanosecond laser technology 
610 1 |a абляции 
610 1 |a металлизация 
610 1 |a керамика 
610 1 |a лазерные технологии 
701 0 |a Wang Li 
701 1 |a Fu  |b Z.  |g Zongwen 
701 1 |a Suess-Wolf  |b R.  |g Robert 
701 1 |a Greil  |b P.  |g Peter 
701 1 |a Travitsky (Travitzky)  |b N.  |c specialist in the field of material science  |c Professor of Tomsk Polytechnic University  |f 1951-  |g Nakhum  |3 (RuTPU)RU\TPU\pers\42461 
701 1 |a Franke  |b J.  |g Joerg 
712 0 2 |a Национальный исследовательский Томский политехнический университет  |b Инженерная школа новых производственных технологий  |b Отделение материаловедения  |3 (RuTPU)RU\TPU\col\23508 
801 2 |a RU  |b 63413507  |c 20200716  |g RCR 
856 4 |u https://doi.org/10.1002/adem.201900096 
942 |c CF