Improvement of a powerful ion Br - Diode parameters by changing the distribution of the magnetic flux in the anode – cathode gap
| Parent link: | Vacuum Vol. 176.— 2020.— [109336, 5 p.] |
|---|---|
| Korporace: | , |
| Další autoři: | , , , , , |
| Shrnutí: | Title screen The influence of magnetic flux distribution in the anode-cathode gap on the parameters of ion Br – diode was investigated. The distribution of the magnetic field formed by an external power source along the anode and cathodes surfaces of the ion diode was obtained. In addition, the diode current-voltage characteristics were measured by changing the magnetic field induction from 0.4 to 1.5 T. The increase in the magnetic field induction on the anode surface was shown to change the diode operating modes. The difference of the magnetic field value near the surfaces of anode and cathodes was compensated by an increase in the ion current. Режим доступа: по договору с организацией-держателем ресурса |
| Jazyk: | angličtina |
| Vydáno: |
2020
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| Témata: | |
| On-line přístup: | https://doi.org/10.1016/j.vacuum.2020.109336 |
| Médium: | Elektronický zdroj Kapitola |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=662152 |
MARC
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| 200 | 1 | |a Improvement of a powerful ion Br - Diode parameters by changing the distribution of the magnetic flux in the anode – cathode gap |f A. V. Stepanov, Zhong Haowen, Zhang Shijian [et al.] | |
| 203 | |a Text |c electronic | ||
| 300 | |a Title screen | ||
| 330 | |a The influence of magnetic flux distribution in the anode-cathode gap on the parameters of ion Br – diode was investigated. The distribution of the magnetic field formed by an external power source along the anode and cathodes surfaces of the ion diode was obtained. In addition, the diode current-voltage characteristics were measured by changing the magnetic field induction from 0.4 to 1.5 T. The increase in the magnetic field induction on the anode surface was shown to change the diode operating modes. The difference of the magnetic field value near the surfaces of anode and cathodes was compensated by an increase in the ion current. | ||
| 333 | |a Режим доступа: по договору с организацией-держателем ресурса | ||
| 461 | |t Vacuum | ||
| 463 | |t Vol. 176 |v [109336, 5 p.] |d 2020 | ||
| 610 | 1 | |a электронный ресурс | |
| 610 | 1 | |a труды учёных ТПУ | |
| 610 | 1 | |a ion diode | |
| 610 | 1 | |a magnetic field configuration | |
| 610 | 1 | |a current-voltage characteristic | |
| 610 | 1 | |a ion beam | |
| 610 | 1 | |a ионные диоды | |
| 610 | 1 | |a магнитное поле | |
| 610 | 1 | |a вольтамперные характеристики | |
| 610 | 1 | |a ионные пучки | |
| 701 | 1 | |a Stepanov |b A. V. |c physicist |c Researcher of Tomsk Polytechnic University |f 1981- |g Andrey Vladimirovich |3 (RuTPU)RU\TPU\pers\32029 |9 16076 | |
| 701 | 0 | |a Zhong Haowen | |
| 701 | 0 | |a Zhang Shijian | |
| 701 | 0 | |a Xu Mofei | |
| 701 | 0 | |a Le Xiaoyun | |
| 701 | 1 | |a Remnev |b G. E. |c physicist |c Professor of Tomsk Polytechnic University, Doctor of technical sciences |f 1948- |g Gennady Efimovich |3 (RuTPU)RU\TPU\pers\31500 | |
| 712 | 0 | 2 | |a Национальный исследовательский Томский политехнический университет |b Инженерная школа новых производственных технологий |b Научно-производственная лаборатория "Импульсно-пучковых, электроразрядных и плазменных технологий" |3 (RuTPU)RU\TPU\col\23502 |
| 712 | 0 | 2 | |a Национальный исследовательский Томский политехнический университет |b Исследовательская школа физики высокоэнергетических процессов |c (2017- ) |3 (RuTPU)RU\TPU\col\23551 |
| 801 | 2 | |a RU |b 63413507 |c 20200522 |g RCR | |
| 856 | 4 | |u https://doi.org/10.1016/j.vacuum.2020.109336 | |
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