Self-images contrast enhancement for displacement Talbot lithography by means of composite mesoscale amplitude-phase masks

Self-images contrast enhancement for displacement Talbot lithography by means of composite mesoscale amplitude-phase masks

Bibliographic Details
Parent link:Journal of Optics
Vol. 22, iss. 1.— 2020.— [015002, 9 p.]
Corporate Author: Национальный исследовательский Томский политехнический университет Инженерная школа неразрушающего контроля и безопасности Отделение электронной инженерии
Other Authors: Geints Yu. E. Yuri, Minin O. V. Oleg Vladilenovich, Minin I. V. Igor Vladilenovich, Zemlyanov Yu. E. Alexander
Summary:Title screen
We propose a new design of composite wavelength-scale amplitude-phase diffraction grating as applied to the displacement Talbot lithography. The grating is composed of a conventional metal amplitude binary mask with superposed dielectric phase steps and provides for manyfold optical contrast enhancement of the integrated 'Talbot carpet' as opposed to the amplitude and phase masks purely. By means of the finite element calculations, we analyze the spatial field structure in the proposed gratings with different geometric ridge shapes and show that due to Mie-type resonances excitation the semielliptical dielectric steps in the combination with metal amplitude mask demonstrate excellent spatial resolution (~${\lambda }/4$) and highest optical contrast (~22 dB) of integrated Talbot self-images.
Published: 2020
Subjects:
электронный ресурс
труды учёных ТПУ
контрастность
изображения
Online Access:https://doi.org/10.1088/2040-8986/ab5b7d
Format: Electronic Book Chapter
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=662124

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