Self-images contrast enhancement for displacement Talbot lithography by means of composite mesoscale amplitude-phase masks; Journal of Optics; Vol. 22, iss. 1
| Parent link: | Journal of Optics Vol. 22, iss. 1.— 2020.— [015002, 9 p.] |
|---|---|
| Korporativní autor: | |
| Další autoři: | , , , |
| Shrnutí: | Title screen We propose a new design of composite wavelength-scale amplitude-phase diffraction grating as applied to the displacement Talbot lithography. The grating is composed of a conventional metal amplitude binary mask with superposed dielectric phase steps and provides for manyfold optical contrast enhancement of the integrated 'Talbot carpet' as opposed to the amplitude and phase masks purely. By means of the finite element calculations, we analyze the spatial field structure in the proposed gratings with different geometric ridge shapes and show that due to Mie-type resonances excitation the semielliptical dielectric steps in the combination with metal amplitude mask demonstrate excellent spatial resolution (~${\lambda }/4$) and highest optical contrast (~22 dB) of integrated Talbot self-images. |
| Jazyk: | angličtina |
| Vydáno: |
2020
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| Témata: | |
| On-line přístup: | https://doi.org/10.1088/2040-8986/ab5b7d |
| Médium: | Elektronický zdroj Kapitola |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=662124 |
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| 200 | 1 | |a Self-images contrast enhancement for displacement Talbot lithography by means of composite mesoscale amplitude-phase masks |f Yu. E. Geints, O. V. Minin, I. V. Minin, Yu. E. Zemlyanov | |
| 203 | |a Text |c electronic | ||
| 300 | |a Title screen | ||
| 320 | |a [References: 39 tit.] | ||
| 330 | |a We propose a new design of composite wavelength-scale amplitude-phase diffraction grating as applied to the displacement Talbot lithography. The grating is composed of a conventional metal amplitude binary mask with superposed dielectric phase steps and provides for manyfold optical contrast enhancement of the integrated 'Talbot carpet' as opposed to the amplitude and phase masks purely. By means of the finite element calculations, we analyze the spatial field structure in the proposed gratings with different geometric ridge shapes and show that due to Mie-type resonances excitation the semielliptical dielectric steps in the combination with metal amplitude mask demonstrate excellent spatial resolution (~${\lambda }/4$) and highest optical contrast (~22 dB) of integrated Talbot self-images. | ||
| 461 | |t Journal of Optics | ||
| 463 | |t Vol. 22, iss. 1 |v [015002, 9 p.] |d 2020 | ||
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| 701 | 1 | |a Geints |b Yu. E. |g Yuri | |
| 701 | 1 | |a Minin |b O. V. |c physicist |c professor of Tomsk Polytechnic University, Doctor of technical sciences |f 1960- |g Oleg Vladilenovich |3 (RuTPU)RU\TPU\pers\44941 | |
| 701 | 1 | |a Minin |b I. V. |c physicist |c Senior researcher of Tomsk Polytechnic University, Doctor of technical sciences |f 1960- |g Igor Vladilenovich |3 (RuTPU)RU\TPU\pers\37571 | |
| 701 | 1 | |a Zemlyanov |b Yu. E. |g Alexander | |
| 712 | 0 | 2 | |a Национальный исследовательский Томский политехнический университет |b Инженерная школа неразрушающего контроля и безопасности |b Отделение электронной инженерии |3 (RuTPU)RU\TPU\col\23507 |
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