Self-images contrast enhancement for displacement Talbot lithography by means of composite mesoscale amplitude-phase masks; Journal of Optics; Vol. 22, iss. 1

Podrobná bibliografie
Parent link:Journal of Optics
Vol. 22, iss. 1.— 2020.— [015002, 9 p.]
Korporativní autor: Национальный исследовательский Томский политехнический университет Инженерная школа неразрушающего контроля и безопасности Отделение электронной инженерии
Další autoři: Geints Yu. E. Yuri, Minin O. V. Oleg Vladilenovich, Minin I. V. Igor Vladilenovich, Zemlyanov Yu. E. Alexander
Shrnutí:Title screen
We propose a new design of composite wavelength-scale amplitude-phase diffraction grating as applied to the displacement Talbot lithography. The grating is composed of a conventional metal amplitude binary mask with superposed dielectric phase steps and provides for manyfold optical contrast enhancement of the integrated 'Talbot carpet' as opposed to the amplitude and phase masks purely. By means of the finite element calculations, we analyze the spatial field structure in the proposed gratings with different geometric ridge shapes and show that due to Mie-type resonances excitation the semielliptical dielectric steps in the combination with metal amplitude mask demonstrate excellent spatial resolution (~${\lambda }/4$) and highest optical contrast (~22 dB) of integrated Talbot self-images.
Jazyk:angličtina
Vydáno: 2020
Témata:
On-line přístup:https://doi.org/10.1088/2040-8986/ab5b7d
Médium: Elektronický zdroj Kapitola
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=662124
Popis
Shrnutí:Title screen
We propose a new design of composite wavelength-scale amplitude-phase diffraction grating as applied to the displacement Talbot lithography. The grating is composed of a conventional metal amplitude binary mask with superposed dielectric phase steps and provides for manyfold optical contrast enhancement of the integrated 'Talbot carpet' as opposed to the amplitude and phase masks purely. By means of the finite element calculations, we analyze the spatial field structure in the proposed gratings with different geometric ridge shapes and show that due to Mie-type resonances excitation the semielliptical dielectric steps in the combination with metal amplitude mask demonstrate excellent spatial resolution (~${\lambda }/4$) and highest optical contrast (~22 dB) of integrated Talbot self-images.
DOI:10.1088/2040-8986/ab5b7d