Effect of short-pulsed 200 keV C+ ion beam and continuous 350 keV He2+ ion beam irradiation on optical properties of Al-Si-N coatings with a various Si content; Surface and Coatings Technology; Vol. 389

Opis bibliograficzny
Parent link:	Surface and Coatings Technology Vol. 389.— 2020.— [125564, 8 p.]
organizacja autorów:	Национальный исследовательский Томский политехнический университет Исследовательская школа физики высокоэнергетических процессов, Национальный исследовательский Томский политехнический университет Инженерная школа новых производственных технологий Научно-производственная лаборатория "Импульсно-пучковых, электроразрядных и плазменных технологий", Национальный исследовательский Томский политехнический университет Инженерная школа ядерных технологий Отделение экспериментальной физики
Kolejni autorzy:	Konusov F. V. Fedor Valerievich, Pavlov S. K. Sergey Konstantinovich, Lauk A. L. Aleksandr Lukyanovich, Tarbokov V. A. Vladislav Aleksandrovich, Karpov S. P. Semen Petrovich, Karpov V. B. Valeriy Borisovich, Gadirov R. M. Ruslan Mukhamedzhanovich, Kashkarov E. B. Egor Borisovich, Remnev G. E. Gennady Efimovich
Streszczenie:	Title screen The article reports on the irradiation effects of 350 keV helium ions in the continuous mode and 200 keV carbon ions in the mode of short-pulsed implantation with doses of 20 MGy, 200 MGy and 600 MGy on the optical properties of crystalline aluminum nitride films and nanocomposite coatings based on Al-Si-N triple compound deposited by reactive magnetron sputtering onto a steel substrate. The energy and kinetic characteristics of the absorption spectra due to radiation defects and their simplest complexes are determined. Short-pulsed ion implantation is accompanied by intense radiation and thermal annealing of unstable radiation defects, along with their complexes and the formation of thermostable defect complexes. The influence of the interaction between the states of defects with the growth and/or radiation nature localized in the forbidden zone with the depth on the properties is established. Dose dependences of the optical characteristics indicate a high radiation resistance of the coatings. The radiation resistance of the coatings is due to the limiting effect of high concentration of growth defects on the accumulation of radiation defects, the wide band gap of nitrides, and the interaction of defects through the exchange of charge carriers between their levels. Режим доступа: по договору с организацией-держателем ресурса
Język:	angielski
Wydane:	2020
Hasła przedmiotowe:	электронный ресурс труды учёных ТПУ ion beam Al-Si-N coatings radiation defects absorption покрытия ионные пучки радиационный эффект поглощение
Dostęp online:	https://doi.org/10.1016/j.surfcoat.2020.125564
Format:	Elektroniczne Rozdział
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=662105