The Influence of High-Energy Krypton Ion Implantation Temperature on Structure and Properties of Ni–Ti Alloy

Bibliografiske detaljer
Parent link:Russian Physics Journal
Vol. 61, iss. 11.— 2019.— [P. 2012–2018]
Hovedforfatter: Poltavtseva V. P. Valentina Petrovna
Institution som forfatter: Национальный исследовательский Томский политехнический университет (ТПУ) Институт неразрушающего контроля (ИНК) Проблемная научно-исследовательская лаборатория электроники, диэлектриков и полупроводников (ПНИЛ ЭДиП)
Andre forfattere: Gyngazov (Ghyngazov) S. A. Sergey Anatolievich, Satpaev D. A. Dashi Anatoljevich
Summary:Title screen
The influence of the temperature of implantation of Ni–Ti shape memory alloy with 84Kr15+ions at the energy E = 147 MeV on its structural-phase state is investigated. At the implantation temperatures 250 and 300°С, within the projective range Rp and out-range area the following processes and phenomena are observed: new formation of the martensitic В19'-phase, formation of nano-sized particles of the R-phase, increase in resistivity due to the formation of radiation-defect structures, strengthening of the alloy in the austenitic structural-phase state, and longer phase-transition temperature intervals.
Режим доступа: по договору с организацией-держателем ресурса
Sprog:engelsk
Udgivet: 2019
Fag:
Online adgang:https://doi.org/10.1007/s11182-019-01631-0
Format: Electronisk Book Chapter
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=662064

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