High-intensity chromium ion implantation into Zr-1Nb alloy; Surface and Coatings Technology; Vol. 383
| Parent link: | Surface and Coatings Technology Vol. 383.— 2020.— [125272, 6 p.] |
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| Egile korporatiboa: | , |
| Beste egile batzuk: | , , , |
| Gaia: | Title screen High-intensity low energy chromium ions implantation was used for surface modification of zirconium Zr-1Nb alloy. The Cr ions were extracted from cathodic arc plasma and focused ballistically using a negatively biased hemispherical grid electrode immersed in plasma. The microstructure, phase composition and elemental distribution of Cr-implanted alloy were studied by scanning electron microscopy (SEM), X-ray diffraction (XRD) and energy dispersive X-ray spectroscopy (EDX), respectively. The results revealed the formation of ZrCr2 Laves phase of C15 polytype after Cr ions implantation. The content of Laves phase increases with implantation temperature up to 22 vol% (at 900 °C). The Laves phase precipitations are nucleated and grew alternately inside the a-Zr solid solution matrix. The high-temperature (HT) oxidation resistance of Cr-implanted samples was analyzed during HT oxidation test in steam at 1000 and 1200 °C for 10 min. Режим доступа: по договору с организацией-держателем ресурса |
| Hizkuntza: | ingelesa |
| Argitaratua: |
2020
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| Gaiak: | |
| Sarrera elektronikoa: | https://doi.org/10.1016/j.surfcoat.2019.125272 |
| Formatua: | Baliabide elektronikoa Liburu kapitulua |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=661687 |
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| 200 | 1 | |a High-intensity chromium ion implantation into Zr-1Nb alloy |f A. I. Ryabchikov [et al.] | |
| 203 | |a Text |c electronic | ||
| 300 | |a Title screen | ||
| 320 | |a [References: 39 tit.] | ||
| 330 | |a High-intensity low energy chromium ions implantation was used for surface modification of zirconium Zr-1Nb alloy. The Cr ions were extracted from cathodic arc plasma and focused ballistically using a negatively biased hemispherical grid electrode immersed in plasma. The microstructure, phase composition and elemental distribution of Cr-implanted alloy were studied by scanning electron microscopy (SEM), X-ray diffraction (XRD) and energy dispersive X-ray spectroscopy (EDX), respectively. The results revealed the formation of ZrCr2 Laves phase of C15 polytype after Cr ions implantation. The content of Laves phase increases with implantation temperature up to 22 vol% (at 900 °C). The Laves phase precipitations are nucleated and grew alternately inside the a-Zr solid solution matrix. The high-temperature (HT) oxidation resistance of Cr-implanted samples was analyzed during HT oxidation test in steam at 1000 and 1200 °C for 10 min. | ||
| 333 | |a Режим доступа: по договору с организацией-держателем ресурса | ||
| 461 | |t Surface and Coatings Technology | ||
| 463 | |t Vol. 383 |v [125272, 6 p.] |d 2020 | ||
| 610 | 1 | |a электронный ресурс | |
| 610 | 1 | |a труды учёных ТПУ | |
| 610 | 1 | |a high-intensity ion implantation | |
| 610 | 1 | |a chromium | |
| 610 | 1 | |a zirconium alloy | |
| 610 | 1 | |a Laves phase | |
| 610 | 1 | |a high-temperature oxidation | |
| 610 | 1 | |a microstructure | |
| 610 | 1 | |a ионная имплантация | |
| 610 | 1 | |a хром | |
| 610 | 1 | |a сплавы циркония | |
| 610 | 1 | |a высокотемпературное окисление | |
| 610 | 1 | |a микроструктура | |
| 701 | 1 | |a Ryabchikov |b A. I. |c Professor of Tomsk Polytechnic University, Doctor of physical and mathematical sciences |c physicist |f 1950- |g Aleksandr Ilyich |3 (RuTPU)RU\TPU\pers\30912 | |
| 701 | 1 | |a Kashkarov |b E. B. |c Physicist |c Associate Professor, Researcher of Tomsk Polytechnic University, Candidate of Physical and Mathematical Sciences |f 1991- |g Egor Borisovich |3 (RuTPU)RU\TPU\pers\34949 |9 18267 | |
| 701 | 1 | |a Shevelev |b A. E. |c Physicist |c Engineer of Tomsk Polytechnic University |f 1990- |g Aleksey Eduardovich |3 (RuTPU)RU\TPU\pers\36832 | |
| 701 | 1 | |a Syrtanov |b M. S. |c physicist |c Associate Professor, Researcher of Tomsk Polytechnic University, Candidate of Technical Sciences |f 1990- |g Maksim Sergeevich |3 (RuTPU)RU\TPU\pers\34764 |9 18114 | |
| 712 | 0 | 2 | |a Национальный исследовательский Томский политехнический университет |b Инженерная школа ядерных технологий |b Отделение экспериментальной физики |3 (RuTPU)RU\TPU\col\23549 |
| 712 | 0 | 2 | |a Национальный исследовательский Томский политехнический университет |b Инженерная школа ядерных технологий |b Научная лаборатория высокоинтенсивной имплантации ионов |3 (RuTPU)RU\TPU\col\23698 |
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