Structural-Phase State of the Zr-Y-O Layer in the Zr-Y-O/Si Al-N Coating at Long Annealing using "in-situ" Observation

Detalhes bibliográficos
Parent link:AIP Conference Proceedings
Vol. 2167 : Advanced Materials with Hierarchical Structure for New Technologies and Reliable Structures 2019 (AMHS'19).— 2019.— [020096, 4 p.]
Autor Corporativo: Национальный исследовательский Томский политехнический университет Инженерная школа новых производственных технологий Отделение материаловедения
Outros Autores: Fedorishcheva M. V. Marina Vladimirovna, Nikonenko A. V., Kalashnikov M. P. Mark Petrovich, Bozhko I. A. Irina Aleksandrovna, Sergeev V. P. Viktor Petrovich
Resumo:Title screen
TEM research of the structure of the multilayered coatings consisting of the alternating Si-Al-N and Zr-Y-O layers an equal thickness was carried out. The Zr-Y-O layers in the Zr-Y-O/Si-Al-N multilayer coating have a columnar structure, the diameter of a column reaches 80 nm, the column height is about 1000 nm, which, in this case, corresponds to the thickness of the deposited layer. The structure of the Si-Al-N layers is amorphous. High temperature annealing at 900 °С for 20-120 min leads to a change in the structural-phase state. The untransformable t' phase appears at a temperature of 900 °С after a 20 minute exposure, the grain size reaches its maximal value after a 70 minute exposure and does not change further.
Режим доступа: по договору с организацией-держателем ресурса
Publicado em: 2019
Assuntos:
Acesso em linha:https://doi.org/10.1063/1.5131963
Formato: Recurso Electrónico Capítulo de Livro
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=661483
Descrição
Resumo:Title screen
TEM research of the structure of the multilayered coatings consisting of the alternating Si-Al-N and Zr-Y-O layers an equal thickness was carried out. The Zr-Y-O layers in the Zr-Y-O/Si-Al-N multilayer coating have a columnar structure, the diameter of a column reaches 80 nm, the column height is about 1000 nm, which, in this case, corresponds to the thickness of the deposited layer. The structure of the Si-Al-N layers is amorphous. High temperature annealing at 900 °С for 20-120 min leads to a change in the structural-phase state. The untransformable t' phase appears at a temperature of 900 °С after a 20 minute exposure, the grain size reaches its maximal value after a 70 minute exposure and does not change further.
Режим доступа: по договору с организацией-держателем ресурса
DOI:10.1063/1.5131963