Formation of Cr-Zr gradient layer by magnetron sputtering and ion mixing

Chi tiết về thư mục
Parent link:MATEC Web of Conferences
Vol. 298 : International Conference on Modern Trends in Manufacturing Technologies and Equipment: Mechanical Engineering and Materials Science (ICMTMTE 2019).— 2019.— [00088, 6 p.]
Nhiều tác giả của công ty: Национальный исследовательский Томский политехнический университет Инженерная школа ядерных технологий Отделение экспериментальной физики, Национальный исследовательский Томский политехнический университет Инженерная школа ядерных технологий Научно-образовательный центр Б. П. Вейнберга
Tác giả khác: Kashkarov E. B. Egor Borisovich, Sidelev D. V. Dmitry Vladimirovich, Rombaeva M. R. Mayya Ramazanovna, Kudiyarov V. N. Victor Nikolaevich, Lomygin A. D. Anton Dmitrievich
Tóm tắt:Title screen
The gradient Cr-Zr layer was formed onto Zr-1Nb substrate by magnetron sputtering of chromium and zirconium targets and ion mixing (Ar+ with 25 keV). The distribution of Cr and Zr elements in the deposited coatings was measured by using a glow discharge optical emission spectroscopy. The optimal ion fluence onto the substrate was 8×1019 ion/m2. At higher ion dose, the intensive sputtering of the deposited coating was observed.
Được phát hành: 2019
Những chủ đề:
Truy cập trực tuyến:https://doi.org/10.1051/matecconf/201929800088
Định dạng: Điện tử Chương của sách
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=661369
Miêu tả
Tóm tắt:Title screen
The gradient Cr-Zr layer was formed onto Zr-1Nb substrate by magnetron sputtering of chromium and zirconium targets and ion mixing (Ar+ with 25 keV). The distribution of Cr and Zr elements in the deposited coatings was measured by using a glow discharge optical emission spectroscopy. The optimal ion fluence onto the substrate was 8×1019 ion/m2. At higher ion dose, the intensive sputtering of the deposited coating was observed.
DOI:10.1051/matecconf/201929800088