Chromium films deposition by hot target high power pulsed magnetron sputtering: Deposition conditions and film properties; Surface and Coatings Technology; Vol. 375

Chromium films deposition by hot target high power pulsed magnetron sputtering: Deposition conditions and film properties; Surface and Coatings Technology; Vol. 375

Detalles Bibliográficos
Parent link:Surface and Coatings Technology
Vol. 375.— 2019.— [P. 352-362]
Autor Corporativo: Национальный исследовательский Томский политехнический университет Инженерная школа ядерных технологий Научно-образовательный центр Б. П. Вейнберга
Otros Autores: Grudinin V. A. Vladislav Alekseevich, Bleykher (Bleicher) G. A. Galina Alekseevna, Sidelev D. V. Dmitry Vladimirovich, Krivobokov V. P. Valery Pavlovich, Bestetti M. Massimiliano, Vicenzo A. Antonello, Franz S. Silvia
Sumario:Title screen
This study focuses on the deposition conditions, structural and mechanical properties of Cr films obtained by magnetron sputtering with hot target, and using high power pulsed supply with pre-ionization (pulse frequency 500?Hz, duty cycle 4% in the range of averaged power from 15 to 40?W/cm2). It has been found that hot target leads to a tenfold increase in the energy flux to the substrate compared to magnetron sputtering with cooled target. Intense sublimation from the target allows increasing the deposition rate of Cr films of about an order of magnitude. Moreover, the increase in the magnetron power may be accompanied by less heating of the substrates when depositing films of the same thickness. High power pulsed magnetron sputtering (HPPMS) with sublimating Cr hot target can be characterized by a combined mode in the film structure formation, leading to the formation of pores at the initial stage of growth. Cr films with a thickness of about 10??m, obtained using a hot target, have lower surface roughness, hardness, and Young's modulus compared with sputtered Cr from a cooled target.
AM_Agreement
Lenguaje:inglés
Publicado: 2019
Materias:
электронный ресурс
труды учёных ТПУ
high power pulsed magnetron sputtering (HPPMS)
Cr films and coatings
hot target
sublimation
film growth
импульсное магнетронное распыление
сублимация
Acceso en línea:https://doi.org/10.1016/j.surfcoat.2019.07.025
Formato: Electrónico Capítulo de libro
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=661052

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