Chromium films deposition by hot target high power pulsed magnetron sputtering: Deposition conditions and film properties; Surface and Coatings Technology; Vol. 375
| Parent link: | Surface and Coatings Technology Vol. 375.— 2019.— [P. 352-362] |
|---|---|
| 団体著者: | |
| その他の著者: | , , , , , , |
| 要約: | Title screen This study focuses on the deposition conditions, structural and mechanical properties of Cr films obtained by magnetron sputtering with hot target, and using high power pulsed supply with pre-ionization (pulse frequency 500?Hz, duty cycle 4% in the range of averaged power from 15 to 40?W/cm2). It has been found that hot target leads to a tenfold increase in the energy flux to the substrate compared to magnetron sputtering with cooled target. Intense sublimation from the target allows increasing the deposition rate of Cr films of about an order of magnitude. Moreover, the increase in the magnetron power may be accompanied by less heating of the substrates when depositing films of the same thickness. High power pulsed magnetron sputtering (HPPMS) with sublimating Cr hot target can be characterized by a combined mode in the film structure formation, leading to the formation of pores at the initial stage of growth. Cr films with a thickness of about 10??m, obtained using a hot target, have lower surface roughness, hardness, and Young's modulus compared with sputtered Cr from a cooled target. AM_Agreement |
| 言語: | 英語 |
| 出版事項: |
2019
|
| 主題: | |
| オンライン･アクセス: | https://doi.org/10.1016/j.surfcoat.2019.07.025 |
| フォーマット: | 電子媒体 図書の章 |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=661052 |
MARC
| LEADER | 00000naa0a2200000 4500 | ||
|---|---|---|---|
| 001 | 661052 | ||
| 005 | 20260210071611.0 | ||
| 035 | |a (RuTPU)RU\TPU\network\31275 | ||
| 035 | |a RU\TPU\network\30233 | ||
| 090 | |a 661052 | ||
| 100 | |a 20191119d2019 k||y0rusy50 ba | ||
| 101 | 0 | |a eng | |
| 135 | |a drcn ---uucaa | ||
| 181 | 0 | |a i | |
| 182 | 0 | |a b | |
| 200 | 1 | |a Chromium films deposition by hot target high power pulsed magnetron sputtering: Deposition conditions and film properties |f V. A. Grudinin [et al.] | |
| 203 | |a Text |c electronic | ||
| 300 | |a Title screen | ||
| 320 | |a [References: 41 tit.] | ||
| 330 | |a This study focuses on the deposition conditions, structural and mechanical properties of Cr films obtained by magnetron sputtering with hot target, and using high power pulsed supply with pre-ionization (pulse frequency 500?Hz, duty cycle 4% in the range of averaged power from 15 to 40?W/cm2). It has been found that hot target leads to a tenfold increase in the energy flux to the substrate compared to magnetron sputtering with cooled target. Intense sublimation from the target allows increasing the deposition rate of Cr films of about an order of magnitude. Moreover, the increase in the magnetron power may be accompanied by less heating of the substrates when depositing films of the same thickness. High power pulsed magnetron sputtering (HPPMS) with sublimating Cr hot target can be characterized by a combined mode in the film structure formation, leading to the formation of pores at the initial stage of growth. Cr films with a thickness of about 10??m, obtained using a hot target, have lower surface roughness, hardness, and Young's modulus compared with sputtered Cr from a cooled target. | ||
| 371 | 0 | |a AM_Agreement | |
| 461 | 1 | |t Surface and Coatings Technology | |
| 463 | 1 | |t Vol. 375 |v [P. 352-362] |d 2019 | |
| 610 | 1 | |a электронный ресурс | |
| 610 | 1 | |a труды учёных ТПУ | |
| 610 | 1 | |a high power pulsed magnetron sputtering (HPPMS) | |
| 610 | 1 | |a Cr films and coatings | |
| 610 | 1 | |a hot target | |
| 610 | 1 | |a sublimation | |
| 610 | 1 | |a film growth | |
| 610 | 1 | |a импульсное магнетронное распыление | |
| 610 | 1 | |a сублимация | |
| 701 | 1 | |a Grudinin |b V. A. |c physicist |c engineer of Tomsk Polytechnic University |f 1995- |g Vladislav Alekseevich |3 (RuTPU)RU\TPU\pers\42519 |9 21548 | |
| 701 | 1 | |a Bleykher (Bleicher) |b G. A. |c physicist |c Professor of Tomsk Polytechnic University, Doctor of Physical and Mathematical Sciences |f 1961- |g Galina Alekseevna |3 (RuTPU)RU\TPU\pers\31496 |9 15657 | |
| 701 | 1 | |a Sidelev |b D. V. |c physicist |c Associate Professor of Tomsk Polytechnic University, Candidate of Technical Sciences |f 1991- |g Dmitry Vladimirovich |y Tomsk |3 (RuTPU)RU\TPU\pers\34524 |9 17905 | |
| 701 | 1 | |a Krivobokov |b V. P. |c Russian physicist |c professor of Tomsk Polytechnic University (TPU), Doctor of Physical and Mathematical Sciences (DSc) |f 1948- |g Valery Pavlovich |3 (RuTPU)RU\TPU\pers\30416 |9 14757 | |
| 701 | 1 | |a Bestetti |b M. |c physicist |c Researcher of Tomsk Polytechnic University |f 1965- |g Massimiliano |3 (RuTPU)RU\TPU\pers\37134 |9 20127 | |
| 701 | 1 | |a Vicenzo |b A. |g Antonello | |
| 701 | 1 | |a Franz |b S. |g Silvia | |
| 712 | 0 | 2 | |a Национальный исследовательский Томский политехнический университет |b Инженерная школа ядерных технологий |b Научно-образовательный центр Б. П. Вейнберга |3 (RuTPU)RU\TPU\col\23561 |9 28358 |
| 801 | 2 | |a RU |b 63413507 |c 20191121 |g RCR | |
| 856 | 4 | |u https://doi.org/10.1016/j.surfcoat.2019.07.025 | |
| 942 | |c CF | ||