Influence of Technological Process for Microelectromechanical Sensors Manufacturing on their Technical Characteristics; Materials Science Forum; Vol. 970 : Modern Problems in Materials Processing, Manufacturing, Testing and Quality Assurance II
| Parent link: | Materials Science Forum: Scientific Journal Vol. 970 : Modern Problems in Materials Processing, Manufacturing, Testing and Quality Assurance II.— 2019.— [P. 123-129] |
|---|---|
| Auteur principal: | |
| Collectivité auteur: | |
| Autres auteurs: | , |
| Résumé: | Title screen The article discusses the technological process for MEMS sensors manufacturing, which provides the minimum allowable technological defects to achieve MEMS technical characteristics. The paper deals with experiments on the definition of technological operations and the choice of their parameters. The factors influencing the size of technological defects are revealed. There is a technology to manufacture MEMS considered as "silicon on glass." There were successful experiments with the use of mask thickness of 540 nm and 450 nm. The slope of the faces does not exceed 1o, the maximum height of the surface roughness profile was 75 nm. Режим доступа: по договору с организацией-держателем ресурса |
| Langue: | anglais |
| Publié: |
2019
|
| Sujets: | |
| Accès en ligne: | https://doi.org/10.4028/www.scientific.net/MSF.970.123 |
| Format: | Électronique Chapitre de livre |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=660926 |
MARC
| LEADER | 00000nla2a2200000 4500 | ||
|---|---|---|---|
| 001 | 660926 | ||
| 005 | 20240222153433.0 | ||
| 035 | |a (RuTPU)RU\TPU\network\31064 | ||
| 035 | |a RU\TPU\network\31062 | ||
| 090 | |a 660926 | ||
| 100 | |a 20191107a2019 k y0engy50 ba | ||
| 101 | 0 | |a eng | |
| 102 | |a CH | ||
| 105 | |a y z 100zy | ||
| 135 | |a drgn ---uucaa | ||
| 181 | 0 | |a i | |
| 182 | 0 | |a b | |
| 200 | 1 | |a Influence of Technological Process for Microelectromechanical Sensors Manufacturing on their Technical Characteristics |f T. G. Nesterenko, E. S. Barbin, A. N. Koleda | |
| 203 | |a Text |c electronic | ||
| 300 | |a Title screen | ||
| 330 | |a The article discusses the technological process for MEMS sensors manufacturing, which provides the minimum allowable technological defects to achieve MEMS technical characteristics. The paper deals with experiments on the definition of technological operations and the choice of their parameters. The factors influencing the size of technological defects are revealed. There is a technology to manufacture MEMS considered as "silicon on glass." There were successful experiments with the use of mask thickness of 540 nm and 450 nm. The slope of the faces does not exceed 1o, the maximum height of the surface roughness profile was 75 nm. | ||
| 333 | |a Режим доступа: по договору с организацией-держателем ресурса | ||
| 461 | 0 | |0 (RuTPU)RU\TPU\network\24092 |t Materials Science Forum |o Scientific Journal | |
| 463 | 0 | |0 (RuTPU)RU\TPU\network\30892 |t Vol. 970 : Modern Problems in Materials Processing, Manufacturing, Testing and Quality Assurance II |o September 2019, Tomsk, Russia |f National Research Tomsk Polytechnic University (TPU) ; ed. A. P. Surzhikov |v [P. 123-129] |d 2019 | |
| 610 | 1 | |a электронный ресурс | |
| 610 | 1 | |a труды учёных ТПУ | |
| 610 | 1 | |a Glass Etching | |
| 610 | 1 | |a Gold Sputtering | |
| 610 | 1 | |a MEMS | |
| 610 | 1 | |a Photoresist | |
| 610 | 1 | |a Silicon Oxide Mask | |
| 610 | 1 | |a Technological Errors | |
| 610 | 1 | |a травление | |
| 610 | 1 | |a стекла | |
| 610 | 1 | |a золотые покрытия | |
| 610 | 1 | |a напыления | |
| 610 | 1 | |a фоторезисторы | |
| 610 | 1 | |a датчики | |
| 610 | 1 | |a технологические процессы | |
| 610 | 1 | |a дефекты | |
| 610 | 1 | |a шероховатости | |
| 700 | 1 | |a Nesterenko |b T. G. |c specialist in the field of mechanical engineering |c Associate Professor of Tomsk Polytechnic University, Candidate of technical sciences |f 1946- |g Tamara Georgievna |3 (RuTPU)RU\TPU\pers\30970 |9 15208 | |
| 701 | 1 | |a Barbin |b E. S. |c specialist in the field of instrument engineering |c engineer of Tomsk Polytechnic University |f 1988- |g Evgeny Sergeevich |3 (RuTPU)RU\TPU\pers\36470 | |
| 701 | 1 | |a Koleda |b A. N. |c Specialist in the field of instrument making |c Engineer of Tomsk Polytechnic University |f 1985- |g Aleksey Nikolaevich |3 (RuTPU)RU\TPU\pers\33286 |9 17031 | |
| 712 | 0 | 2 | |a Национальный исследовательский Томский политехнический университет |b Инженерная школа неразрушающего контроля и безопасности |b Отделение электронной инженерии |3 (RuTPU)RU\TPU\col\23507 |
| 801 | 2 | |a RU |b 63413507 |c 20191107 |g RCR | |
| 856 | 4 | |u https://doi.org/10.4028/www.scientific.net/MSF.970.123 | |
| 942 | |c CF | ||