Progress in High Intensity, Low Ion Energy Implantation Method Development

Progress in High Intensity, Low Ion Energy Implantation Method Development

Detalles Bibliográficos
Parent link:	Surface Modification of Materials by Ion Beams (SMMIB-2019): 21st International Conference, 25-30 August 2019, Tomsk, Russia/ National Research Tomsk Polytechnic University (TPU). [P. 25].— , 2019
Autor Principal:	Ryabchikov A. I. Aleksandr Ilyich
Autor Corporativo:	Национальный исследовательский Томский политехнический университет Инженерная школа ядерных технологий Научная лаборатория высокоинтенсивной имплантации ионов
Summary:	Заглавие с экрана
Publicado:	2019
Series:	Ion Beam Processing of Materials. Invited Talks
Subjects:	электронный ресурс труды учёных ТПУ имплантация легирующие примеси численное моделирование низкоэнергетические ионы металлы полупроводники газы элементный состав микроструктуры свойства
Acceso en liña:	https://smmib.ru/assets/files/SMMIB2019_TOMSK_full.pdf#page=26
Formato:	Electrónico Capítulo de libro
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=660863

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