New set up for diamond coatings deposition in AC glow discharge plasma on WC-Co milling cutters of complex shape; Diamond and Related Materials; Vol. 94

New set up for diamond coatings deposition in AC glow discharge plasma on WC-Co milling cutters of complex shape; Diamond and Related Materials; Vol. 94

Dades bibliogràfiques
Parent link:	Diamond and Related Materials Vol. 94.— 2019.— [P. 166–171]
Autor principal:	Linnik S. A. Stepan Andreevich
Autor corporatiu:	Национальный исследовательский Томский политехнический университет Инженерная школа новых производственных технологий Научно-производственная лаборатория "Импульсно-пучковых, электроразрядных и плазменных технологий", Национальный исследовательский Томский политехнический университет Исследовательская школа физики высокоэнергетических процессов
Altres autors:	Gaydaychuk A. V. Alexander Valerievich
Sumari:	Title screen In the current work, we developed a new type of CVD reactor for high-speed deposition of uniform diamond coatings on WC-Co milling cutters in AC glow discharge plasma with two plasma channels in the Ar/H2/CH4 atmosphere. This CVD system successfully allowed one to deposit well-adherent MCD, UNCD and Multilayer diamond coatings with a thickness up to 60 μm on WC-Co milling cutters of various geometries and with a diameter up to 14 mm. We found that to minimize the edge effect, the optimal energy input for each plasma cord should be set in the range of 1.4-2.5 kW. We also found that diluting the H2/CH4 atmosphere with argon in the range of 45-80% vol. is one of the necessary conditions to control the deposition process. Diamond deposition rate has been achieved up to 2.5-3 μm/h with a uniformity of deposition over 50% from maximum thickness. Presented CVD system is very promising due to sufficiently high deposition rateand ease of implementation, and it also has great potential for industrial scaling. Режим доступа: по договору с организацией-держателем ресурса
Idioma:	anglès
Publicat:	2019
Matèries:	электронный ресурс труды учёных ТПУ тлеющий разряд алмазные покрытия плазма
Accés en línia:	https://doi.org/10.1016/j.diamond.2019.03.011
Format:	Electrònic Capítol de llibre
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=659966

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