New set up for diamond coatings deposition in AC glow discharge plasma on WC-Co milling cutters of complex shape; Diamond and Related Materials; Vol. 94
| Parent link: | Diamond and Related Materials Vol. 94.— 2019.— [P. 166–171] |
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| Kurumsal yazarlar: | , |
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| Özet: | Title screen In the current work, we developed a new type of CVD reactor for high-speed deposition of uniform diamond coatings on WC-Co milling cutters in AC glow discharge plasma with two plasma channels in the Ar/H2/CH4 atmosphere. This CVD system successfully allowed one to deposit well-adherent MCD, UNCD and Multilayer diamond coatings with a thickness up to 60 μm on WC-Co milling cutters of various geometries and with a diameter up to 14 mm. We found that to minimize the edge effect, the optimal energy input for each plasma cord should be set in the range of 1.4-2.5 kW. We also found that diluting the H2/CH4 atmosphere with argon in the range of 45-80% vol. is one of the necessary conditions to control the deposition process. Diamond deposition rate has been achieved up to 2.5-3 μm/h with a uniformity of deposition over 50% from maximum thickness. Presented CVD system is very promising due to sufficiently high deposition rateand ease of implementation, and it also has great potential for industrial scaling. Режим доступа: по договору с организацией-держателем ресурса |
| Dil: | İngilizce |
| Baskı/Yayın Bilgisi: |
2019
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| Konular: | |
| Online Erişim: | https://doi.org/10.1016/j.diamond.2019.03.011 |
| Materyal Türü: | Elektronik Kitap Bölümü |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=659966 |
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| 200 | 1 | |a New set up for diamond coatings deposition in AC glow discharge plasma on WC-Co milling cutters of complex shape |f S. A. Linnik, A. V. Gaydaychuk | |
| 203 | |a Text |c electronic | ||
| 300 | |a Title screen | ||
| 320 | |a [References: 29 tit.] | ||
| 330 | |a In the current work, we developed a new type of CVD reactor for high-speed deposition of uniform diamond coatings on WC-Co milling cutters in AC glow discharge plasma with two plasma channels in the Ar/H2/CH4 atmosphere. This CVD system successfully allowed one to deposit well-adherent MCD, UNCD and Multilayer diamond coatings with a thickness up to 60 μm on WC-Co milling cutters of various geometries and with a diameter up to 14 mm. We found that to minimize the edge effect, the optimal energy input for each plasma cord should be set in the range of 1.4-2.5 kW. We also found that diluting the H2/CH4 atmosphere with argon in the range of 45-80% vol. is one of the necessary conditions to control the deposition process. Diamond deposition rate has been achieved up to 2.5-3 μm/h with a uniformity of deposition over 50% from maximum thickness. Presented CVD system is very promising due to sufficiently high deposition rateand ease of implementation, and it also has great potential for industrial scaling. | ||
| 333 | |a Режим доступа: по договору с организацией-держателем ресурса | ||
| 461 | |t Diamond and Related Materials | ||
| 463 | |t Vol. 94 |v [P. 166–171] |d 2019 | ||
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| 700 | 1 | |a Linnik |b S. A. |c physicist |c Engineer-Researcher of Tomsk Polytechnic University |f 1985- |g Stepan Andreevich |3 (RuTPU)RU\TPU\pers\32877 |9 16725 | |
| 701 | 1 | |a Gaydaychuk |b A. V. |c physicist |c Postgraduate, Engineer - Researcher of Tomsk Polytechnic University |f 1984- |g Alexander Valerievich |3 (RuTPU)RU\TPU\pers\32876 |9 16724 | |
| 712 | 0 | 2 | |a Национальный исследовательский Томский политехнический университет |b Инженерная школа новых производственных технологий |b Научно-производственная лаборатория "Импульсно-пучковых, электроразрядных и плазменных технологий" |3 (RuTPU)RU\TPU\col\23502 |
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