Influence of Bias Voltage and CH4/N2 Gas Ratio on the Structure and Mechanical Properties of TiCN Coatings Deposited by Cathodic Arc Deposition Method

Influence of Bias Voltage and CH4/N2 Gas Ratio on the Structure and Mechanical Properties of TiCN Coatings Deposited by Cathodic Arc Deposition Method

Dades bibliogràfiques
Parent link:Journal of Materials Engineering and Performance
Vol. 28, iss. 1.— 2019.— [P. 343-354]
Autor corporatiu: Национальный исследовательский Томский политехнический университет Инженерная школа ядерных технологий
Altres autors: Petkov N. Nikolay, Kashkarov E. B. Egor Borisovich, Obrosov A. Aleksey, Bakalova T. Totka, Kejzlar P. Pavel, Bahchedzhiev H. Hristo
Sumari:Title screen
This article presents a study of the influence of the bias voltage and CH4/N2 gas ratio on the structure and mechanical properties of TiCN coatings. The coatings are deposited by cathodic arc deposition technology from Ti cathodes under an atmosphere of a mixture of CH4 and N2 gasses. XRD analysis shows that an increase in the methane flow changes the preferential orientation of the coating from (111) to (200) and results in a refinement of the structure (grain size reduction from 23 to 7 nm). SEM analysis shows that the coatings are stoichiometric. It was demonstrated that the bias voltage has an influence on the grain size, hardness and elasticity module. The highest hardness value of 52.5 GPa was measured at the coatings lacking a clear preferential orientation. The adhesion of the coatings showed a critical load in the range of 29-64 N.
Режим доступа: по договору с организацией-держателем ресурса
Publicat: 2019
Matèries:
электронный ресурс
труды учёных ТПУ
cathodic arc deposition
nanohardness
TiCN coatings
XRD analysis
осаждение
нанотвердость
Accés en línia:https://doi.org/10.1007/s11665-018-3754-3
Format: Electrònic Capítol de llibre
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=659401

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