Influence of Bias Voltage and CH4/N2 Gas Ratio on the Structure and Mechanical Properties of TiCN Coatings Deposited by Cathodic Arc Deposition Method; Journal of Materials Engineering and Performance; Vol. 28, iss. 1

書誌詳細
Parent link:Journal of Materials Engineering and Performance
Vol. 28, iss. 1.— 2019.— [P. 343-354]
団体著者: Национальный исследовательский Томский политехнический университет Инженерная школа ядерных технологий
その他の著者: Petkov N. Nikolay, Kashkarov E. B. Egor Borisovich, Obrosov A. Aleksey, Bakalova T. Totka, Kejzlar P. Pavel, Bahchedzhiev H. Hristo
要約:Title screen
This article presents a study of the influence of the bias voltage and CH4/N2 gas ratio on the structure and mechanical properties of TiCN coatings. The coatings are deposited by cathodic arc deposition technology from Ti cathodes under an atmosphere of a mixture of CH4 and N2 gasses. XRD analysis shows that an increase in the methane flow changes the preferential orientation of the coating from (111) to (200) and results in a refinement of the structure (grain size reduction from 23 to 7 nm). SEM analysis shows that the coatings are stoichiometric. It was demonstrated that the bias voltage has an influence on the grain size, hardness and elasticity module. The highest hardness value of 52.5 GPa was measured at the coatings lacking a clear preferential orientation. The adhesion of the coatings showed a critical load in the range of 29-64 N.
Режим доступа: по договору с организацией-держателем ресурса
言語:英語
出版事項: 2019
主題:
オンライン・アクセス:https://doi.org/10.1007/s11665-018-3754-3
フォーマット: 電子媒体 図書の章
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=659401

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