Influence of Bias Voltage and CH4/N2 Gas Ratio on the Structure and Mechanical Properties of TiCN Coatings Deposited by Cathodic Arc Deposition Method; Journal of Materials Engineering and Performance; Vol. 28, iss. 1

Influence of Bias Voltage and CH4/N2 Gas Ratio on the Structure and Mechanical Properties of TiCN Coatings Deposited by Cathodic Arc Deposition Method; Journal of Materials Engineering and Performance; Vol. 28, iss. 1

Bibliographic Details
Parent link:	Journal of Materials Engineering and Performance Vol. 28, iss. 1.— 2019.— [P. 343-354]
Corporate Author:	Национальный исследовательский Томский политехнический университет Инженерная школа ядерных технологий
Other Authors:	Petkov N. Nikolay, Kashkarov E. B. Egor Borisovich, Obrosov A. Aleksey, Bakalova T. Totka, Kejzlar P. Pavel, Bahchedzhiev H. Hristo
Summary:	Title screen This article presents a study of the influence of the bias voltage and CH4/N2 gas ratio on the structure and mechanical properties of TiCN coatings. The coatings are deposited by cathodic arc deposition technology from Ti cathodes under an atmosphere of a mixture of CH4 and N2 gasses. XRD analysis shows that an increase in the methane flow changes the preferential orientation of the coating from (111) to (200) and results in a refinement of the structure (grain size reduction from 23 to 7 nm). SEM analysis shows that the coatings are stoichiometric. It was demonstrated that the bias voltage has an influence on the grain size, hardness and elasticity module. The highest hardness value of 52.5 GPa was measured at the coatings lacking a clear preferential orientation. The adhesion of the coatings showed a critical load in the range of 29-64 N. Режим доступа: по договору с организацией-держателем ресурса
Language:	English
Published:	2019
Subjects:	электронный ресурс труды учёных ТПУ cathodic arc deposition nanohardness TiCN coatings XRD analysis осаждение нанотвердость
Online Access:	https://doi.org/10.1007/s11665-018-3754-3
Format:	Electronic Book Chapter
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=659401

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