Influence of Bias Voltage and CH4/N2 Gas Ratio on the Structure and Mechanical Properties of TiCN Coatings Deposited by Cathodic Arc Deposition Method
| Parent link: | Journal of Materials Engineering and Performance Vol. 28, iss. 1.— 2019.— [P. 343-354] |
|---|---|
| Corporate Author: | |
| Other Authors: | , , , , , |
| Summary: | Title screen This article presents a study of the influence of the bias voltage and CH4/N2 gas ratio on the structure and mechanical properties of TiCN coatings. The coatings are deposited by cathodic arc deposition technology from Ti cathodes under an atmosphere of a mixture of CH4 and N2 gasses. XRD analysis shows that an increase in the methane flow changes the preferential orientation of the coating from (111) to (200) and results in a refinement of the structure (grain size reduction from 23 to 7 nm). SEM analysis shows that the coatings are stoichiometric. It was demonstrated that the bias voltage has an influence on the grain size, hardness and elasticity module. The highest hardness value of 52.5 GPa was measured at the coatings lacking a clear preferential orientation. The adhesion of the coatings showed a critical load in the range of 29-64 N. Режим доступа: по договору с организацией-держателем ресурса |
| Language: | English |
| Published: |
2019
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| Subjects: | |
| Online Access: | https://doi.org/10.1007/s11665-018-3754-3 |
| Format: | Electronic Book Chapter |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=659401 |
MARC
| LEADER | 00000naa0a2200000 4500 | ||
|---|---|---|---|
| 001 | 659401 | ||
| 005 | 20250321151757.0 | ||
| 035 | |a (RuTPU)RU\TPU\network\27957 | ||
| 090 | |a 659401 | ||
| 100 | |a 20190215d2019 k||y0rusy50 ba | ||
| 101 | 0 | |a eng | |
| 102 | |a US | ||
| 135 | |a drcn ---uucaa | ||
| 181 | 0 | |a i | |
| 182 | 0 | |a b | |
| 200 | 1 | |a Influence of Bias Voltage and CH4/N2 Gas Ratio on the Structure and Mechanical Properties of TiCN Coatings Deposited by Cathodic Arc Deposition Method |f N. Petkov [et al.] | |
| 203 | |a Text |c electronic | ||
| 300 | |a Title screen | ||
| 320 | |a [References: 57 tit.] | ||
| 330 | |a This article presents a study of the influence of the bias voltage and CH4/N2 gas ratio on the structure and mechanical properties of TiCN coatings. The coatings are deposited by cathodic arc deposition technology from Ti cathodes under an atmosphere of a mixture of CH4 and N2 gasses. XRD analysis shows that an increase in the methane flow changes the preferential orientation of the coating from (111) to (200) and results in a refinement of the structure (grain size reduction from 23 to 7 nm). SEM analysis shows that the coatings are stoichiometric. It was demonstrated that the bias voltage has an influence on the grain size, hardness and elasticity module. The highest hardness value of 52.5 GPa was measured at the coatings lacking a clear preferential orientation. The adhesion of the coatings showed a critical load in the range of 29-64 N. | ||
| 333 | |a Режим доступа: по договору с организацией-держателем ресурса | ||
| 461 | |t Journal of Materials Engineering and Performance | ||
| 463 | |t Vol. 28, iss. 1 |v [P. 343-354] |d 2019 | ||
| 610 | 1 | |a электронный ресурс | |
| 610 | 1 | |a труды учёных ТПУ | |
| 610 | 1 | |a cathodic arc deposition | |
| 610 | 1 | |a nanohardness | |
| 610 | 1 | |a TiCN coatings | |
| 610 | 1 | |a XRD analysis | |
| 610 | 1 | |a осаждение | |
| 610 | 1 | |a нанотвердость | |
| 701 | 1 | |a Petkov |b N. |g Nikolay | |
| 701 | 1 | |a Kashkarov |b E. B. |c Physicist |c Associate Professor, Researcher of Tomsk Polytechnic University, Candidate of Physical and Mathematical Sciences |f 1991- |g Egor Borisovich |3 (RuTPU)RU\TPU\pers\34949 |9 18267 | |
| 701 | 1 | |a Obrosov |b A. |g Aleksey | |
| 701 | 1 | |a Bakalova |b T. |g Totka | |
| 701 | 1 | |a Kejzlar |b P. |g Pavel | |
| 701 | 1 | |a Bahchedzhiev |b H. |g Hristo | |
| 712 | 0 | 2 | |a Национальный исследовательский Томский политехнический университет |b Инженерная школа ядерных технологий |c (2017- ) |3 (RuTPU)RU\TPU\col\23380 |
| 801 | 2 | |a RU |b 63413507 |c 20190215 |g RCR | |
| 856 | 4 | |u https://doi.org/10.1007/s11665-018-3754-3 | |
| 942 | |c CF | ||