Национальный исследовательский Томский политехнический университет Инженерная школа ядерных технологий, Petkov N. Nikolay, Kashkarov E. B. Egor Borisovich, Obrosov A. Aleksey, Bakalova T. Totka, Kejzlar P. Pavel, & Bahchedzhiev H. Hristo. (2019). Influence of Bias Voltage and CH4/N2 Gas Ratio on the Structure and Mechanical Properties of TiCN Coatings Deposited by Cathodic Arc Deposition Method; Journal of Materials Engineering and Performance; Vol. 28, iss. 1. 2019. https://doi.org/10.1007/s11665-018-3754-3
Chicago Style (17th ed.) CitationНациональный исследовательский Томский политехнический университет Инженерная школа ядерных технологий, Petkov N. Nikolay, Kashkarov E. B. Egor Borisovich, Obrosov A. Aleksey, Bakalova T. Totka, Kejzlar P. Pavel, and Bahchedzhiev H. Hristo. Influence of Bias Voltage and CH4/N2 Gas Ratio on the Structure and Mechanical Properties of TiCN Coatings Deposited by Cathodic Arc Deposition Method; Journal of Materials Engineering and Performance; Vol. 28, Iss. 1. 2019, 2019. https://doi.org/10.1007/s11665-018-3754-3.
MLA (9th ed.) CitationНациональный исследовательский Томский политехнический университет Инженерная школа ядерных технологий, et al. Influence of Bias Voltage and CH4/N2 Gas Ratio on the Structure and Mechanical Properties of TiCN Coatings Deposited by Cathodic Arc Deposition Method; Journal of Materials Engineering and Performance; Vol. 28, Iss. 1. 2019, 2019. https://doi.org/10.1007/s11665-018-3754-3.