Joint influence of steered vacuum arc and negative repetitively pulsed bias on titanium macroparticles suppression

Detaylı Bibliyografya
Parent link:Surface and Coatings Technology
Vol. 355.— 2018.— [P. 240-246]
Müşterek Yazar: Национальный исследовательский Томский политехнический университет Инженерная школа ядерных технологий Научная лаборатория высокоинтенсивной имплантации ионов
Diğer Yazarlar: Ryabchikov A. I. Aleksandr Ilyich, Ananin P. S. Petr Semenovich, Shevelev A. E. Aleksey Eduardovich, Dektyarev S. V. Sergey Valentinovich, Sivin D. O. Denis Olegovich, Ivanova A. I. Anna Ivanovna
Özet:Title screen
This paper presents the results of an experimental study of titanium macroparticle accumulation on a negatively biased substrate immersed in DC vacuum arc plasmagenerated by an evaporator with an axial magnetic field and a steered arc evaporator. Using a steered arc with a tangential magnetic field strength of 200 Gs reduced the generation of macroparticles 5-fold compared to a plasma source with an axial magnetic field. The application of repetitively pulsed negative bias significantly decreased macroparticle assembly on the substrate surface for both evaporator designs. After 20 min of ion-plasma treatment with negatively pulsed bias (−2 kV, 7 μs, 105 p.p.s.) and steered arc, the observed macroparticle surface density appeared to be 2 orders of magnitude smaller than after vacuum arc plasma deposition at the anode potential using an evaporator with an axial magnetic field. The possibility of high-frequency short-pulse plasma immersion ion implantation by implementing DC vacuum arc plasma is discussed.
Режим доступа: по договору с организацией-держателем ресурса
Baskı/Yayın Bilgisi: 2018
Konular:
Online Erişim:https://doi.org/10.1016/j.surfcoat.2018.02.047
Materyal Türü: Elektronik Kitap Bölümü
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=659304

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