Joint influence of steered vacuum arc and negative repetitively pulsed bias on titanium macroparticles suppression; Surface and Coatings Technology; Vol. 355
| Parent link: | Surface and Coatings Technology Vol. 355.— 2018.— [P. 240-246] |
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| Institution som forfatter: | |
| Andre forfattere: | , , , , , |
| Summary: | Title screen This paper presents the results of an experimental study of titanium macroparticle accumulation on a negatively biased substrate immersed in DC vacuum arc plasmagenerated by an evaporator with an axial magnetic field and a steered arc evaporator. Using a steered arc with a tangential magnetic field strength of 200 Gs reduced the generation of macroparticles 5-fold compared to a plasma source with an axial magnetic field. The application of repetitively pulsed negative bias significantly decreased macroparticle assembly on the substrate surface for both evaporator designs. After 20 min of ion-plasma treatment with negatively pulsed bias (−2 kV, 7 μs, 105 p.p.s.) and steered arc, the observed macroparticle surface density appeared to be 2 orders of magnitude smaller than after vacuum arc plasma deposition at the anode potential using an evaporator with an axial magnetic field. The possibility of high-frequency short-pulse plasma immersion ion implantation by implementing DC vacuum arc plasma is discussed. Режим доступа: по договору с организацией-держателем ресурса |
| Sprog: | engelsk |
| Udgivet: |
2018
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| Fag: | |
| Online adgang: | https://doi.org/10.1016/j.surfcoat.2018.02.047 |
| Format: | MixedMaterials Electronisk Book Chapter |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=659304 |
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| 200 | 1 | |a Joint influence of steered vacuum arc and negative repetitively pulsed bias on titanium macroparticles suppression |f A. I. Ryabchikov [et al.] | |
| 203 | |a Text |c electronic | ||
| 300 | |a Title screen | ||
| 320 | |a [References: 28 tit.] | ||
| 330 | |a This paper presents the results of an experimental study of titanium macroparticle accumulation on a negatively biased substrate immersed in DC vacuum arc plasmagenerated by an evaporator with an axial magnetic field and a steered arc evaporator. Using a steered arc with a tangential magnetic field strength of 200 Gs reduced the generation of macroparticles 5-fold compared to a plasma source with an axial magnetic field. The application of repetitively pulsed negative bias significantly decreased macroparticle assembly on the substrate surface for both evaporator designs. After 20 min of ion-plasma treatment with negatively pulsed bias (−2 kV, 7 μs, 105 p.p.s.) and steered arc, the observed macroparticle surface density appeared to be 2 orders of magnitude smaller than after vacuum arc plasma deposition at the anode potential using an evaporator with an axial magnetic field. The possibility of high-frequency short-pulse plasma immersion ion implantation by implementing DC vacuum arc plasma is discussed. | ||
| 333 | |a Режим доступа: по договору с организацией-держателем ресурса | ||
| 461 | |t Surface and Coatings Technology | ||
| 463 | |t Vol. 355 |v [P. 240-246] |d 2018 | ||
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| 610 | 1 | |a макрочастицы | |
| 610 | 1 | |a высокочастотные импульсы | |
| 701 | 1 | |a Ryabchikov |b A. I. |c Professor of Tomsk Polytechnic University, Doctor of physical and mathematical sciences |c physicist |f 1950- |g Aleksandr Ilyich |3 (RuTPU)RU\TPU\pers\30912 | |
| 701 | 1 | |a Ananin |b P. S. |c physicist |c senior researcher of Tomsk Polytechnic University, candidate of physical and mathematical sciences |f 1942- |g Petr Semenovich |3 (RuTPU)RU\TPU\pers\35673 | |
| 701 | 1 | |a Shevelev |b A. E. |c Physicist |c Engineer of Tomsk Polytechnic University |f 1990- |g Aleksey Eduardovich |3 (RuTPU)RU\TPU\pers\36832 | |
| 701 | 1 | |a Dektyarev |b S. V. |c physicist |c design engineer of Tomsk Polytechnic University |f 1957- |g Sergey Valentinovich |3 (RuTPU)RU\TPU\pers\35672 | |
| 701 | 1 | |a Sivin |b D. O. |c physicist |c Senior researcher of Tomsk Polytechnic University, Candidate of technical sciences |f 1978- |g Denis Olegovich |3 (RuTPU)RU\TPU\pers\34240 | |
| 701 | 1 | |a Ivanova |b A. I. |c physicist |c Associate Scientist of Tomsk Polytechnic University |f 1987- |g Anna Ivanovna |3 (RuTPU)RU\TPU\pers\36986 |9 20002 | |
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